Plasma-based ion implantation and deposition: A review of physics, technology, and applications

IEEE Transactions on Plasma Science

Volumn 33, Issue 6 I, 2005, Pages 1944-1959

  Pelletier, Jacques ^a   Anders, André ^b  

^a CNRS   (France)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Ion assisted thin film deposition; Plasma based ion implantation; Pulsed bias

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ION BEAMS; PHYSICAL VAPOR DEPOSITION; PLASMA DIAGNOSTICS; PLASMA SHEATHS; PLASMA SOURCES; PROBES; SURFACE TREATMENT; THIN FILMS; TRIBOLOGY;

CONVENTIONAL ION BEAM IMPLANTATION; ION-ASSISTED THIN FILM DEPOSITION; PLASMA-BASED ION IMPLANTATION; PROBE MEASUREMENTS; PULSED BIAS; SHEATH DYNAMICS;

ION IMPLANTATION;

EID: 30544434362     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.860079     Document Type: Review

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