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Volumn 16, Issue 10, 2004, Pages 1751-1760
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Stress relief and texture formation in aluminium nitride by plasma immersion ion implantation
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Author keywords
[No Author keywords available]
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Indexed keywords
CATHODIC ARC DEPOSITION;
EXPONENTIAL FUNCTIONS;
IN PLANE ORIENTATION;
PLASMA IMMERSION ION IMPLANTATION;
PULSE VOLTAGE PULSE FREQUENCY;
CRYSTAL ORIENTATION;
ELECTRODEPOSITION;
FREQUENCIES;
FUNCTIONS;
ION BEAMS;
ION IMPLANTATION;
LASER PULSES;
PLASMAS;
STRESSES;
TEXTURES;
THIN FILMS;
THRESHOLD VOLTAGE;
ALUMINUM NITRIDE;
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EID: 1642368056
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/16/10/007 Document Type: Article |
Times cited : (22)
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References (15)
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