Multilayers of amorphous carbon prepared by cathodic arc deposition

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 189-194

  Anders, Simone ^a   Callahan, Daniel L ^b   Pharr, George M ^b   Tsui, Ting Y ^c   Bhatia, C Singh ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Rice University   (United States)

^c ADVANCED MICRO DEVICES   (United States)

^d IBM   (United States)

Author keywords

Amorphous carbon film; Cathodic arc deposition; Monte Carlo simulation

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; FILM PREPARATION; MONTE CARLO METHODS; MULTILAYERS; NANOSTRUCTURED MATERIALS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS CARBON; CATHODIC ARC DEPOSITION;

AMORPHOUS FILMS;

EID: 0031245737     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00346-0     Document Type: Article

References (20)

1. R. Dictsch, personal communication, 1995.
2. R. Lossy, D.L. Pappas, R.A. Roy, J.J. Cuomo and V.M. Sura, Appl. Phys. Lett., 61 (1992) 171.
3. P.J. Fallon, V.S. Veerasamy, C.A. Davis, J. Robertson, G.A.J. Amaratunga, W.I. Milne and J. Koskinen, Phys. Rev. B, 48 (1993) 4777.
4. S. Anders, A. Anders, I.G. Brown, B. Wei, K. Komvopoulos, J.W. Ager III and K.M. Yu, Surf. Coat. Technol., 68/69 (1994) 388.
5. P.J. Martin, S.W. Filipczuk, R.P. Netterfield, J.S. Field, D.W. Whitnall and D.R. McKenzie, J. Mater. Sci. Lett., 7 (1988) 410.
6. S. Falabella, D.B. Boercker and D.M. Sanders, Thin Solid Films, 236 (1993) 82.
7. H.J. Scheibe and B. Schultrich, Thin Solid Films, 246 (1994) 92.
8. D.R. McKenzie, D. Muller, B.A. Pailthorpe, Z.H. Wang, E. Kravtchinskaia, D. Segal, P.B. Lukins, P.J. Martin, G. Amaratunga, P.H. Gaskell and A. Saeed, Diamond Relat. Mater., 1 (1991) 51.
9. J.J. Cuomo, D.L. Pappas, J. Bruley, J.P. Doyle and K.L. Saenger, J. Appl. Phys., 70 (1991) 1706.
10. J.W. Ager III, S. Anders, A. Anders and I.G. Brown, Appl. Phys. Lett., 66 (1995) 3445.
11. M. Weiler, S. Sattel, K. Jung, H. Ehrhardt, V.S. Veerasamy and J. Robertson, Appl. Phys. Lett., 64 (1994) 2797.
12. G.M. Pharr, D.L. Callahan, S.D. McAdams, T.Y. Tsui, S. Anders, A. Anders, J.W. Ager III, I.G. Brown, C.S. Bhatia, S.R.P. Silva and J.R. Robertson, Appl. Phys. Lett., 68 (1996) 779.
13. S. Anders, A. Anders and I.G. Brown, J. Appl. Phys., 74 (1993) 4239.
14. A. Anders, S. Anders and I.G. Brown, Plasma Sources Sci. Technol., 4 (1995) 1.
15. J.P. Biersack, S. Berg and C. Nender, Nucl. Instrum. Methods Phys. Res. B, 59/60 (1991) 21.
16. A. Anders, S. Anders, I.G. Brown and P. Chow, Mater. Res. Soc. Symp. Proc., 314 (1993) 205.
17. I.G. Brown, A. Anders, S. Anders, M.R. Dickinson, I.C. Ivanov, R.A. MacGill, X.Y. Yao and K.M. Yu, Nucl. Instrum. Methods Phys. Res. B, 80/81 (1993) 1281.
18. W.C. Oliver and G.M. Pharr, J. Mater. Res., 7 (1992) 1564.
19. G.M. Pharr, Mater. Res. Soc. Symp. Proc., 239 (1992) 301.
20. S. Anders, A. Anders, J.W. Ager III, Z. Wang, G.M. Pharr, T.Y. Tsui, I.G. Brown and C.S. Bhatia, Mater. Res. Soc. Symp. Proc., 383 (1995) 453.