Transparent AlN layers formed by metal plasma immersion ion implantation and deposition

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 82-87

  Mandl S ^a   Manova, Darina ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

AlN; ERDA; IR Spectroscopy; Spectroscopic ellipsometry

Indexed keywords

ADSORPTION; DEPOSITION; ION IMPLANTATION; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; PLASMAS; SEMICONDUCTOR MATERIALS; THERMAL EFFECTS;

DEFECT STRUCTURES; METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION (MEPIIID); OXYGEN ADSORPTION; PULSE VOLTAGE;

ALUMINUM NITRIDE;

COATING;

EID: 17744368469     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.017     Document Type: Article

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