Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 145-148

  Zeng, Xuchu ^a   Chu, Paul K ^a   Chen, Qingchuan ^b   Tong, Honghui ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

Author keywords

Plasma ion implantation

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; PLASMA SOURCES;

DIRECT-CURRENT PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0035973309     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00950-6     Document Type: Article

References (14)