Energy distribution and depth profile in BF3 plasma doping

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 146-150

  Kwok, Dixon T K ^a   Chu, Paul K ^a   Takase, M ^b   Mizuno, B ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC POTENTIAL; PLASMA SIMULATION; SILICON;

BORON FLUORIDE; PLASMA DOPING;

BORON COMPOUNDS;

EID: 0035254353     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01045-8     Document Type: Article

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