Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: Measurements and analytical considerations

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 85-92

  Anders, André ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA DENSITY; PLASMA SOURCES; VACUUM APPLICATIONS;

METAL SHEATH IMMERSION ION IMPLANTATION; VACUUM ARC PLASMAS;

PLASMA SHEATHS;

EID: 0035254332     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01017-3     Document Type: Article

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