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Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 244-252

Contamination issues in hydrogen plasma immersion ion implantation of silicon - A brief review

(1) Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Impurities; Ion implantation; Plasma processing and deposition

Indexed keywords

CONTAMINATION; FABRICATION; HYDROGEN; IMPURITIES; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; TRANSITION METALS;

VACUUM CHAMBER;

ION IMPLANTATION;

ION IMPLANTATION;

EID: 0036642109 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00100-7 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.