Thermal stability of arc evaporated high aluminum-content Ti1-xAlxN thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1815-1823

  Horling A ^a   Hultman, L ^a   Oden M ^a   Sjolen J ^b   Karlsson, L ^b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANNEALING; CATHODES; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHASE COMPOSITION; PHASE SEPARATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

NANOCRYSTALLITES;

THIN FILMS;

EID: 0036747872     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1503784     Document Type: Article

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