Plasma source ion implantation project at Southwestern Institute of Physics

Surface and Coatings Technology

Volumn 85, Issue 1-2, 1996, Pages 105-110

  Shang, Z K ^a   Chen, K Q ^a   Zeng, X C ^a   Li, J Q ^a   Tong, H H ^a   Wang, H S ^a   Geng, M ^a   Xing, D Z ^a   Wang, J Q ^a  

^a SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

Author keywords

Computer simulation; Plasma source ion implantation; Surface modification; Technology transfer

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BIOCOMPATIBILITY; COMPUTER SIMULATION; FRICTION; HARDNESS; PLASMA SOURCES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE PROPERTIES; SURFACE TREATMENT; TECHNOLOGY TRANSFER; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA SOURCE ION IMPLANTATION; SURFACE MICROHARDNESS; SURFACE MODIFICATION PROPERTIES;

ION IMPLANTATION;

EID: 0030296029     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(96)02861-7     Document Type: Article

References (4)

1. J.Q. Li, PSII Research in Magnetic Well, Nuclear Fusion and Plasma Physics of China, 1991.
2. Z.K. Shang et al., A PSII system in SWIP, 1st Intern. Workshop on PSII, 1993, Madison, WI, USA.
3. X.C. Zeng et al., A simplified high-voltage modulator used in PSII-EX device, 1st Intern. Workshop on PSII, 1993, Madison, WI, USA.
4. N. Huang et al., Research of surface modification of Ti alloy by PSII 1st East Asia Conf. on Biophysics, 1993.