메뉴 건너뛰기




Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 170-176

Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition

Author keywords

DECR; Elementary plasma; PBII

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; SPUTTER DEPOSITION;

EID: 17644420703     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.036     Document Type: Article
Times cited : (22)

References (30)
  • 22
    • 17644397642 scopus 로고    scopus 로고
    • Plasma-based ion implantation: A valuable industrial route for the elaboration of innovative materials submitted to
    • Surf. Coat. Technol./PBII 2003
    • D. Vempaire J. Pelletier D. Fruchart S. Miraglia S. Béchu Y. Arnal Y. Plasma-based ion implantation: A. valuable industrial route for the elaboration of innovative materials submitted to (subitted to Surf. Coat. Technol./PBII 2003)
    • (2003)
    • Vempaire, D.1    Pelletier, J.2    Fruchart, D.3    Miraglia, S.4    Béchu, S.5    Arnal, Y.6
  • 25
    • 17644385647 scopus 로고    scopus 로고
    • 14th Int. Coll. Plasma Processes Processes, CIP 2003, Antibes, France (June 29-July 3, 2003) [Proceedings pp 000-000]
    • Vempaire D. Arnal Y. Béchu S. Maulat O. Pelletier J. 14th Int. Coll. Plasma Processes, CIP 2003, Antibes, France (June 29-July 3, 2003) 2003 [Proceedings pp 000-000]
    • (2003)
    • Vempaire, D.1    Arnal, Y.2    Béchu, S.3    Maulat, O.4    Pelletier, J.5
  • 26
    • 17644382420 scopus 로고    scopus 로고
    • Surf. Coat. Technol./PBII 2003 and PIID processing of diamond-like carbon
    • F. Thièry, C. Vallée, Y. Arnal, J. Pelletier, PECVD and PIID processing of diamond-like carbon (submitted to Surf. Coat. Technol./PBII 2003).
    • (2003)
    • Thièry, F.1    Vallée, C.2    Arnal, J.3    Pelletier, P.E.C.V.D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.