Effects of nitrogen partial pressure and pulse bias voltage on (Ti,Al)N coatings by arc ion plating

Surface and Coatings Technology

Volumn 167, Issue 2-3, 2003, Pages 197-202

  Li, Mingsheng ^a   Wang, Fuhui ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

(Ti,Al)N coatings; Arc ion plating; N2 partial pressure; Pulse bias voltage

Indexed keywords

COMPOSITION; DEPOSITION; ELECTRIC POTENTIAL; NITROGEN; PARTIAL PRESSURE; STAINLESS STEEL;

DROPLET FORMATION;

COATINGS;

ALUMINUM; COATING; ELECTRIC ARC DEPOSITION; NITRIDE; TITANIUM;

EID: 0037461180     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00895-2     Document Type: Article

References (8)

1. D. Mclntyre, J.E. Greene, G. Häkansson E. Sundgren, W.-D. Münz, J. Appl. Phys. 67 (3) (1990) 1542-1553.
2. C. Jarm, H.-R. Stock, P. Mayr, Surf. Coat. Technol. 108/109 (1998) 206-210.
3. S. Creasey, D.B. Lewis, I.J., Smith, W.-D. Münz , Surf. Coat. Technol. 97 (1997) 163-175.
4. B.Y. Shew, J.L. Huang, D.F. Lii, Thin Solid Films. 293 (1997) 212-219.
5. W. Olbrich, G. Kampschulte, Surf. Coat. Technol. 61 (1991) 262-267.
6. R.L. Boxman, S. Goldsmith, Surf. Coat. Technol. 52 (1992) 39-50.
7. B.F. Coll, R. Fontana, A. Gates, P. Sathrum, Mater. Sci. Eng. Part A. 140 (1991) 816-824.
8. E. Lugscheider, O. Knotek, F. Loffler, Surf. Coat. Technol. 76/77 (1995) 700-705.