Plasma immersion ion implantation experiments with long and short rise time pulses using high voltage hard tube pulser

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 43-46

  Rossi, J O ^a   Ueda, M ^a   Barroso, J J ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; GLOW DISCHARGES; ION IMPLANTATION; PULSE GENERATORS;

HIGH VOLTAGE PULSE GENERATORS; PLASMA IMMERSION ION IMPLANTATION (PIII);

PLASMA SOURCES;

EID: 0035253904     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01008-2     Document Type: Article

References (6)

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3. J. Brutcher, Rev. Sci. Imstrum. 67 (1996) 2621-2625.
4. V.A. Spassov, M. Ueda, J. Barroso, Surf. Coat. Technol. 112 (1999) 29-33.
5. J.O. Rossi, M. Ueda, V.A. Spassov, J.J. Barroso, in: Proceedings of the 12th International Pulsed Power Conference, Monterey, CA, USA, 1999.
6. D.J. Rej, Handbook of Thin Film Process Technology, (1996) E2.3:1-E2.3:25.