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Volumn 85, Issue 1-2, 1996, Pages 111-119

Challenges and progress toward a 250 kV, 100 kW plasma ion implantation facility

Author keywords

Plasma ion implantation; Surface modification; Tribology

Indexed keywords

COST EFFECTIVENESS; FACILITIES; HARDNESS; NITROGEN; PLASMA SOURCES; PLASMAS; SURFACE PROPERTIES; SURFACE TREATMENT; TRIBOLOGY; WEAR OF MATERIALS; X RAY PRODUCTION;

EID: 0030296036     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(96)02873-3     Document Type: Article
Times cited : (13)

References (28)
  • 20
    • 85030002205 scopus 로고    scopus 로고
    • US Patent 5,455,061, 3 October 1995
    • J.N. Matossian and J.J. Vajo, US Patent 5,455,061, 3 October 1995.
    • Matossian, J.N.1    Vajo, J.J.2
  • 25
  • 26
    • 85030002802 scopus 로고    scopus 로고
    • US Patent 5,296,272, 22 March 1994
    • J.N. Matossian and D.M. Goebel, US Patent 5,296,272, 22 March 1994.
    • Matossian, J.N.1    Goebel, D.M.2
  • 28


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.