Radiation effects in advanced microelectronics technologies

IEEE Transactions on Nuclear Science

Volumn 45, Issue 3 PART 3, 1998, Pages 1339-1354

  Johnston, A H ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONSUMER ELECTRONICS; DOSIMETRY; ERRORS; INTEGRATED CIRCUIT MANUFACTURE; IONS; MICROELECTRONIC PROCESSING; SPACE APPLICATIONS;

ADVANCED CIRCUIT ARCHITECTURE; COMMERCIAL DEVICES; DOSE EFFECTS; HEAVY IONS;

RADIATION EFFECTS;

EID: 0032097341     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.685206     Document Type: Article

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