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Volumn 44, Issue 6 PART 1, 1997, Pages 2345-2352

Single event gate rupture in thin gate oxides

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC FIELDS; ENERGY TRANSFER; IONS; OXIDES; RADIATION EFFECTS; SEMICONDUCTOR DEVICE TESTING;

EID: 0031386902     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.659060     Document Type: Article
Times cited : (97)

References (17)
  • 2
    • 0030169878 scopus 로고    scopus 로고
    • "An Experimental Survey of Heavy Ion Induced Dielectric Rupture in Actel Field Programmable Gate Arrays (FPGAs),"
    • G. M. Swift and R. Katz, "An Experimental Survey of Heavy Ion Induced Dielectric Rupture in Actel Field Programmable Gate Arrays (FPGAs)," IEEE Trans. Nucl. Sei. NS43, pp. 967-972 (1996).
    • (1996) IEEE Trans. Nucl. Sei. NS , vol.43 , pp. 967-972
    • Swift, G.M.1    Katz, R.2
  • 5
    • 0023562592 scopus 로고
    • "On Heavy Ion Induced Hard-Errors in Dielectric Structures,"
    • T. F. Wrobel, "On Heavy Ion Induced Hard-Errors in Dielectric Structures," IEEE Trans Nucl. Sei. NS34, pp. 1262-1268 (1987).
    • (1987) IEEE Trans Nucl. Sei. NS , vol.34 , pp. 1262-1268
    • Wrobel, T.F.1
  • 7
    • 0028693951 scopus 로고
    • "SingleEvent Gate Rupture in Vertical Power MOSFETs: An Original Empirical Expression,"
    • C. F. Wheatley, J. L. Titus, and D. I. Burton, "SingleEvent Gate Rupture in Vertical Power MOSFETs: An Original Empirical Expression," IEEE Trans. Nucl. Sei. NS41, pp. 2152-2159(1994).
    • (1994) IEEE Trans. Nucl. Sei. NS , vol.41 , pp. 2152-2159
    • Wheatley, C.F.1    Titus, J.L.2    Burton, D.I.3
  • 13
    • 21544458715 scopus 로고
    • "Impact lonization, Trap Creation, Degradation, and Breakdown in Silicon Dioxide Films on Silicon,"
    • D. J. DiMaria, E. Carier, and D. Arnold, "Impact lonization, Trap Creation, Degradation, and Breakdown in Silicon Dioxide Films on Silicon," J. Appl. Phys. 73 (7), pp. 3367-3384 (1993).
    • (1993) J. Appl. Phys. , vol.73 , Issue.7 , pp. 3367-3384
    • Dimaria, D.J.1    Carier, E.2    Arnold, D.3
  • 14
    • 0000814330 scopus 로고    scopus 로고
    • "Anode Hole Injection and Trapping in Silicon Dioxide,"
    • D. J. Maria, E. Cartier, and D. A. Buchanan, "Anode Hole Injection and Trapping in Silicon Dioxide," J. Appl. Phys. 80 (1) pp. 304-317 (1996).
    • (1996) J. Appl. Phys. , vol.80 , Issue.1 , pp. 304-317
    • Maria, D.J.1    Cartier, E.2    Buchanan, D.A.3
  • 16
    • 0021973547 scopus 로고
    • "Dielectric Breakdown in MOS devices, Part l : Defect Related and Intrinsic Breakdown,"
    • D. R. Wolters and J. J. vanderScfioot, "Dielectric Breakdown in MOS devices, Part l : Defect Related and Intrinsic Breakdown," Phillips Jour. Res, 40, pp. 115-136(1985).
    • (1985) Phillips Jour. Res , vol.40 , pp. 115-136
    • Wolters, D.R.1    Vanderscfioot, J.J.2
  • 17
    • 0030387118 scopus 로고    scopus 로고
    • "Gate Oxide Scaling Limits and Projections,"
    • C. Hu, "Gate Oxide Scaling Limits and Projections," ffiDM Technical Digest, pp. 319-322 (1996).
    • (1996) FfiDM Technical Digest , pp. 319-322
    • Hu, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.