Effect of O2 pressure on the preferred orientation of TiO2 films prepared by filtered arc deposition

Thin Solid Films

Volumn 326, Issue 1-2, 1998, Pages 171-174

  Zhang, Feng ^a   Liu, Xianghuai ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Deposition process; Fourier transform infrared spectroscopy; Titanium oxide; X ray diffraction

Indexed keywords

ELECTRIC ARCS; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

FILTERED ARC DEPOSITION;

THIN FILMS;

EID: 0032482850     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00573-2     Document Type: Article

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