SCOPUS 정보 검색 플랫폼

Volumn 258, Issue 15, 2012, Pages 5659-5665

Role of ion energy on growth and optical dispersion of nanocrystalline TiO 2 films prepared by magnetron sputtering with ion assistance at the substrate

(4) Sarma, Bimal K a Pal, Arup R a Bailung, Heremba a Chutia, Joyanti a

a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY (India)

Author keywords

Ion energy; Optical dispersion; Reactive sputtering; Substrate bias

Indexed keywords

AMORPHOUS FILMS; CRYSTALLITE SIZE; DISPERSIONS; FILM GROWTH; INFRARED DEVICES; ION BOMBARDMENT; MAGNETRON SPUTTERING; NANOCRYSTALS; OPTICAL COATINGS; OXIDE MINERALS; REACTIVE SPUTTERING; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ION ENERGIES; NANOCRYSTALLINE TIO2 FILMS; OPTICAL DISPERSION; OPTICAL DISPERSION PARAMETERS; REACTIVE MAGNETRON SPUTTERING; SINGLE-OSCILLATOR MODEL; SUBSTRATE BIAS; VISIBLE AND NEAR INFRARED;

OPTICAL FILMS;

EID: 84859155284 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2012.02.051 Document Type: Article

Times cited : (14)

References (37)

1
- 0036535467
- P. Zeman, and S. Takabayashi Surf. Coat. Technol. 153 2002 93
- (2002) Surf. Coat. Technol. , vol.153 , pp. 93
- Zeman, P.¹ Takabayashi, S.²

2
- 28044457696
- P.K. Song, Y. Irie, and Y. Shigesato Thin Solid Films 496 2006 121
- (2006) Thin Solid Films , vol.496 , pp. 121
- Song, P.K.¹ Irie, Y.² Shigesato, Y.³

3
- 79952361288
- L. Borgese, E. Bontempi, M. Gelfi, L.E. Depero, P. Goudeau, G. Geandier, and D. Thiaudiere Acta Mater. 59 2011 2891
- (2011) Acta Mater. , vol.59 , pp. 2891
- Borgese, L.¹ Bontempi, E.² Gelfi, M.³ Depero, L.E.⁴ Goudeau, P.⁵ Geandier, G.⁶ Thiaudiere, D.⁷

4
- 0018808622
- W.T. Pawlewicz, and R. Busch Thin Solid Films 63 1979 251
- (1979) Thin Solid Films , vol.63 , pp. 251
- Pawlewicz, W.T.¹ Busch, R.²

5
- 0032154152
- N. Martin, D. Baretti, C. Rousselot, and J. Rauch Surf. Coat. Technol. 107 1998 172
- (1998) Surf. Coat. Technol. , vol.107 , pp. 172
- Martin, N.¹ Baretti, D.² Rousselot, C.³ Rauch, J.⁴

6
- 56649103775
- M.F. Hossain, S. Biswas, T. Takahashi, Y. Kubtota, and A. Fujishima Thin Solid Films 517 2008 1091
- (2008) Thin Solid Films , vol.517 , pp. 1091
- Hossain, M.F.¹ Biswas, S.² Takahashi, T.³ Kubtota, Y.⁴ Fujishima, A.⁵

7
- 38949117936
- N. Satoh, T. Nakashima, K. Kamikura, and K. Yamamoto Nat. Nanotechnol. 3 2008 106
- (2008) Nat. Nanotechnol. , vol.3 , pp. 106
- Satoh, N.¹ Nakashima, T.² Kamikura, K.³ Yamamoto, K.⁴

8
- 5644259577
- N. Serpone, D. Lawless, and R. Khairutdinov J. Phys. Chem. 99 1995 16646
- (1995) J. Phys. Chem. , vol.99 , pp. 16646
- Serpone, N.¹ Lawless, D.² Khairutdinov, R.³

9
- 0000321529
- J.D. DeLoach, G. Scarel, and C.R. Aita J. Appl. Phys. 85 1999 2377
- (1999) J. Appl. Phys. , vol.85 , pp. 2377
- Deloach, J.D.¹ Scarel, G.² Aita, C.R.³

10
- 2942666219
- T. Asanuma, T. Matsutani, C. Liu, T. Mihara, and M. Kiuchi J. Appl. Phys. 95 2004 6011
- (2004) J. Appl. Phys. , vol.95 , pp. 6011
- Asanuma, T.¹ Matsutani, T.² Liu, C.³ Mihara, T.⁴ Kiuchi, M.⁵

11
- 0000687524
- M. Jobin, M. Taborelli, and P. Descouts J. Appl. Phys. 77 1995 5149
- (1995) J. Appl. Phys. , vol.77 , pp. 5149
- Jobin, M.¹ Taborelli, M.² Descouts, P.³

12
- 56349101581
- A. Fujishima, X. Zhang, and D.A. Tryk Surf. Sci. Rep. 63 2008 515
- (2008) Surf. Sci. Rep. , vol.63 , pp. 515
- Fujishima, A.¹ Zhang, X.² Tryk, D.A.³

13
- 33746361814
- W. Dai, X. Wang, P. Liu, Y. Xu, G. Li, and X. Fu J. Phys. Chem. B 110 2006 13470
- (2006) J. Phys. Chem. B , vol.110 , pp. 13470
- Dai, W.¹ Wang, X.² Liu, P.³ Xu, Y.⁴ Li, G.⁵ Fu, X.⁶

14
- 33847664704
- J. Shi, J. Chen, Z. Feng, T. Chen, Y. Lian, X. Wang, and C. Li J. Phys. Chem. C 111 2007 693
- (2007) J. Phys. Chem. C , vol.111 , pp. 693
- Shi, J.¹ Chen, J.² Feng, Z.³ Chen, T.⁴ Lian, Y.⁵ Wang, X.⁶ Li, C.⁷

15
- 80455176956
- A.R. Pal, B.K. Sarma, N.C. Adhikary, J. Chutia, and H. Bailung Appl. Surf. Sci. 258 2011 1199
- (2011) Appl. Surf. Sci. , vol.258 , pp. 1199
- Pal, A.R.¹ Sarma, B.K.² Adhikary, N.C.³ Chutia, J.⁴ Bailung, H.⁵

16
- 13444266367
- J. Musil, P. Baroch, J. Vlcek, K.H. Nam, and J.G. Han Thin Solid Films 475 2005 208
- (2005) Thin Solid Films , vol.475 , pp. 208
- Musil, J.¹ Baroch, P.² Vlcek, J.³ Nam, K.H.⁴ Han, J.G.⁵

17
- 44349118471
- S.M. Borah, A.R. Pal, H. Bailung, and J. Chutia Appl. Surf. Sci. 254 2008 5760
- (2008) Appl. Surf. Sci. , vol.254 , pp. 5760
- Borah, S.M.¹ Pal, A.R.² Bailung, H.³ Chutia, J.⁴

18
- 33847707761
- Y. Zhang, X. Ma, P. Chen, and D. Yang J. Cryst. Growth 300 2007 551
- (2007) J. Cryst. Growth , vol.300 , pp. 551
- Zhang, Y.¹ Ma, X.² Chen, P.³ Yang, D.⁴

19
- 0036603503
- N. Kaiser Appl. Opt. 41 2002 3053
- (2002) Appl. Opt. , vol.41 , pp. 3053
- Kaiser, N.¹

20
- 0020940620
- R. Swanepoel J. Phys. E: Sci. Instrum. 16 1983 1214
- (1983) J. Phys. E: Sci. Instrum. , vol.16 , pp. 1214
- Swanepoel, R.¹

21
- 33646439827
- S.H. Wemple, and M. DiDomenico Jr. Phys. Rev. B 3 1971 1338
- (1971) Phys. Rev. B , vol.3 , pp. 1338
- Wemple, S.H.¹ Didomenico Jr., M.²

22
- 34047109564
- I. Horcas, R. Fernandez, J.M. G-Rodriguez, J. Colchero, J. G-Herrero, and A.M. Baro Rev. Sci. Instrum. 78 2007 013705
- (2007) Rev. Sci. Instrum. , vol.78 , pp. 013705
- Horcas, I.¹ Fernandez, R.² G-Rodriguez, J.M.³ Colchero, J.⁴ G-Herrero, J.⁵ Baro, A.M.⁶

23
- 0003400638
- Wiley & Sons New York
- B. Chapman Glow Discharge Processes 1980 Wiley & Sons New York
- (1980) Glow Discharge Processes
- Chapman, B.¹

24
- 0003427458
- third ed. Prentice Hall, Inc. New Jersey
- B.D. Cullity, and S.R. Stock Elements of X-ray Diffraction third ed. 2001 Prentice Hall, Inc. New Jersey
- (2001) Elements of X-ray Diffraction
- Cullity, B.D.¹ Stock, S.R.²

25
- 27144469302
- A.L. Bassi, D. Cattaneo, V. Russo, C.E. Bottani, E. Barborini, T. Mazza, P. Piseri, P. Milani, F.O. Ernst, K. Wegner, and S.E. Pratsinis J. Appl. Phys. 98 2005 074305
- (2005) J. Appl. Phys. , vol.98 , pp. 074305
- Bassi, A.L.¹ Cattaneo, D.² Russo, V.³ Bottani, C.E.⁴ Barborini, E.⁵ Mazza, T.⁶ Piseri, P.⁷ Milani, P.⁸ Ernst, F.O.⁹ Wegner, K.¹⁰ Pratsinis, S.E.¹¹

26
- 43949142473
- V. Swamy Phys. Rev. B 77 2008 195414
- (2008) Phys. Rev. B , vol.77 , pp. 195414
- Swamy, V.¹

27
- 0031547708
- W. Ensinger Nucl. Instrum. Methods Phys. Res. B 127/128 1997 796
- (1997) Nucl. Instrum. Methods Phys. Res. B , vol.127-128 , pp. 796
- Ensinger, W.¹

28
- 0004132773
- Plenum Press London
- J. Tauc Amorphous and Liquid Semiconductors 1974 Plenum Press London
- (1974) Amorphous and Liquid Semiconductors
- Tauc, J.¹

29
- 0011011424
- M. Radecka, K. Zakrzewska, H. Czternastek, and T. Stapinsky Appl. Surf. Sci. 65 1993 227
- (1993) Appl. Surf. Sci. , vol.65 , pp. 227
- Radecka, M.¹ Zakrzewska, K.² Czternastek, H.³ Stapinsky, T.⁴

30
- 0038209696
- S. Tanemura, L. Miao, P. Jin, K. Kaneko, A. Terai, and N. Nabatova-Gabain Appl. Surf. Sci. 212 2003 654
- (2003) Appl. Surf. Sci. , vol.212 , pp. 654
- Tanemura, S.¹ Miao, L.² Jin, P.³ Kaneko, K.⁴ Terai, A.⁵ Nabatova-Gabain, N.⁶

31
- 0018482115
- H.K. Pulker Appl. Opt. 18 1979 1969
- (1979) Appl. Opt. , vol.18 , pp. 1969
- Pulker, H.K.¹

32
- 40149086362
- S. Zhao, F. Ma, K.W. Xu, and H.F. Liang J. Alloys Compd. 453 2008 453
- (2008) J. Alloys Compd. , vol.453 , pp. 453
- Zhao, S.¹ Ma, F.² Xu, K.W.³ Liang, H.F.⁴

33
- 80255134538
- B.K. Sarma, A.R. Pal, H. Bailung, and J. Chutia Plasma Chem. Plasma Process. 31 2011 741
- (2011) Plasma Chem. Plasma Process. , vol.31 , pp. 741
- Sarma, B.K.¹ Pal, A.R.² Bailung, H.³ Chutia, J.⁴

34
- 36149025905
- W.G. Spitzer, and H.Y. Fan Phys. Rev. 106 1957 882
- (1957) Phys. Rev. , vol.106 , pp. 882
- Spitzer, W.G.¹ Fan, H.Y.²

35
- 60549113299
- O.A. Azim, M.M. Abdel-Aziz, and I.S. Yahia Appl. Surf. Sci. 255 2009 4829
- (2009) Appl. Surf. Sci. , vol.255 , pp. 4829
- Azim, O.A.¹ Abdel-Aziz, M.M.² Yahia, I.S.³

36
- 33748046177
- J. Liqiang, Q. Yichun, W. Baiqi, L. Shudan, J. Baojiang, Y. Libin, F. Wei, F. Honggang, and S. Jiazhong Sol. Energy Mater. Sol. Cells 90 2006 1773
- (2006) Sol. Energy Mater. Sol. Cells , vol.90 , pp. 1773
- Liqiang, J.¹ Yichun, Q.² Baiqi, W.³ Shudan, L.⁴ Baojiang, J.⁵ Libin, Y.⁶ Wei, F.⁷ Honggang, F.⁸ Jiazhong, S.⁹

37
- 11944264362
- A. Hagfeldt, and M. Gratzel Chem. Rev. 95 1995 49
- (1995) Chem. Rev. , vol.95 , pp. 49
- Hagfeldt, A.¹ Gratzel, M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.