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Thin Solid Films

Volumn 300, Issue 1-2, 1997, Pages 113-121

Microstructure modification of amorphous titanium oxide thin films during annealing treatment

(5) Martin, Nicolas a Rousselot, Christophe a Rondot, Daniel a Palmino, Franck b Mercier, René c

a Lab Metrologie Interfaces T (France)

b Lab Phys Metrologie Oscillateurs (France)

c Lab Electrochimie Syst M (France)

Author keywords

Atomic force microscopy (AFM); Optical properties; Phase transitions; Physical vapour deposition (PVD)

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MORPHOLOGY; PHASE TRANSITIONS; REFRACTIVE INDEX; THERMAL EFFECTS; TITANIUM OXIDES; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS TITANIUM OXIDE THIN FILMS; PHYSICAL VAPOR DEPOSITION (PVD);

THIN FILMS;

EID: 0031143137 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09510-7 Document Type: Article

Times cited : (262)

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