O- density measurements in the pulsed-DC reactive magnetron sputtering of titanium

Thin Solid Films

Volumn 519, Issue 5, 2010, Pages 1705-1711

  Dodd, Robert ^a   You, Shaodong ^a   Bradley, James W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Langmuir probe; Negative ions; Oxygen; Photo detachment; Pulsed DC magnetron; Reactive sputtering; Time resolved

Indexed keywords

AFTER INITIATION; AVERAGE POWER; BEAM-LIKE STRUCTURES; BULK PLASMA; CENTRE LINE; DENSITY MEASUREMENTS; ELECTRON DENSITIES; LANGMUIRS; OXYGEN PARTIAL PRESSURE; PHASE DENSITY; PHOTO-DETACHMENT; PULSE PERIOD; PULSED DC; PULSED MAGNETRONS; SPATIAL STRUCTURE; TIME-RESOLVED; TOTAL PRESSURE; VOLTAGE PULSE;

DC POWER TRANSMISSION; ELECTRIC POTENTIAL; LANGMUIR PROBES; MAGNETIC FIELDS; NEGATIVE IONS; OXYGEN; PHASE TRANSITIONS; PLASMAS; PROBES; TITANIUM;

ELECTRIC DISCHARGES;

EID: 78649758921     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.06.056     Document Type: Conference Paper

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