Study of electronegative Ar/O2 discharge by means of langmuir probe

Contributions to Plasma Physics

Volumn 48, Issue 5-7, 2008, Pages 503-508

  Stranak V ^a,c   Blazek J ^b   Wrehde, S ^a   Adamek P ^b,c   Hubicka Z ^c   Tichy M ^d   Spatenka P ^b   Hippler, R ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

^d CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Electron density; Electronegative plasma; Negative ion density; Planar magnetron; Probe diagnostics

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; LANGMUIR PROBES; MAGNETRONS; NEGATIVE IONS;

DC DISCHARGES; ELECTRONEGATIVE PLASMAS; EXPERIMENTAL CONDITIONS; ION DENSITY; LANGMUIR PROBE DIAGNOSTICS; NEGATIVE ION DENSITY; PLANAR MAGNETRON; PLASMA POTENTIAL; POWER; PROBE DIAGNOSTICS;

CARRIER CONCENTRATION;

EID: 54549113066     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.200810081     Document Type: Conference Paper

References (9)

1. H. Amemiya, J. Phys., 23, 999 (1990).
2. M. Shindo, Y. Kawai, Surf. and Coat. Technol. 142-144, 355 (2001).
3. M. Shindo, S. Hiejema, Y. Ueda, S. Kawakami, N. Ishii, Y. Kawai, Surf. and Coat. Technol. 116-119, 1065 (1999).
4. R.K. Waits, J. Vac. Sci. Technol. 15(2), 179 (1978).
5. J.A. Thornton, J. Vac. Sci. Technol. 15(2), 171 (1978).
6. V. Straňák, H. Steffen, S. Wrehde, R. Hippler, M. Tichy, Czech. J. Phys. 54, 826 (2004).
7. R. Hippler, S. Wrehde, V. Straňák, O. Zhigalov, H. Steffen, M. Tichý, M. Quaas, H. Wulff, Contrib. Plasma Phys. 45, 348 (2005).
8. N.J. Braithwaite, J.E. Allen, J. Phys. D21, 1733 (1988).
9. E. Stoffels, W.W. Stoffels and K. Tachibana, Rev. Sci. Instrum., Vol. 69, No. 1, 11 (1998).