Pulsed-bias magnetron sputtering of non-conductive crystalline chromia films at low substrate temperature

Journal of Physics D: Applied Physics

Volumn 41, Issue 3, 2008, Pages

  Audronis, M ^a   Matthews, A ^a   Leyland, A ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; ION BOMBARDMENT; MAGNETRON SPUTTERING; OXIDE FILMS; PARAMETER ESTIMATION; VOLTAGE MEASUREMENT;

CHROMIA COATINGS; CRYSTALLINE CHROMIA FILMS; ION ENERGIES;

CRYSTALLINE MATERIALS;

EID: 43049095369     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/3/035309     Document Type: Article

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