Role of energy in low-temperature high-rate formation of hydrophilic Ti O2 thin films using pulsed magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 666-674

  Musil, J ^a   Sicha J ^a   Herman D ^a   Cerstvy R ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROPHILICITY; ION BOMBARDMENT; LOW TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; TITANIUM DIOXIDE;

NANOCRYSTALLINE STRONGLY HYDROPHILIC FILMS; UNHEATED GLASS SUBSTRATES;

THIN FILMS;

EID: 34547281830     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2736680     Document Type: Article

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