Electrochemical pore formation onto semiconductor surfaces

Comptes Rendus Chimie

Volumn 11, Issue 9, 2008, Pages 964-983

  Santinacci, Lionel ^a   Djenizian, Thierry ^b  

^a UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

^b AIX MARSEILLE UNIVERSITY   (France)

Author keywords

Anodic etching; Dissolution Anodique; Electrochemistry; Electrochimie; Pore; Semiconducteurs; Semiconductors

Indexed keywords

EID: 50949123691     PISSN: 16310748     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.crci.2008.06.004     Document Type: Short Survey

References (199)

1. Cullis A.G., and Canham L.T. Nature 353 (1991) 335
2. Huang Y., Duan X.F., Wei Q.Q., and Lieber C.M. Science 291 (2001) 630
3. Xia Y.N., Yang P.D., Sun Y.G., Wu Y.Y., Mayers B., Gates B., Yin Y.D., Kim F., and Yan Y.Q. Adv. Mater. 15 (2003) 353
4. Law M., Greene L.E., Johnson J.C., Saykally R., and Yang P.D. Nat. Mater. 4 (2005) 455
5. Lehmann V., and Gösele U. Appl. Phys. Lett. 58 (1991) 856
6. Canham L.T. Appl. Phys. Lett. 57 (1990) 1046
7. Morrison S.R. Electrochemistry at Semiconductor and Oxidized Metal Electrodes (1980), Plenum Press, New York
8. Sze S.M. Physics of Semiconductor Devices (1981), Wiley-Interscience, New York
9. Smith R.L., and Collins S.D. J. Appl. Phys. 71 (1992) R1
10. Cullis A.G., Canham L.T., and Calcott P.D.J. J. Appl. Phys. 82 (1997) 909
11. Green W.H., Létant S., and Sailor M.J. Electrochemical Formation and Modification of Nanocrystalline Silicon. In: Hodes G. (Ed). Electrochemistry of Nanomaterials (2001), Wiley-VCH, Weinheim 141-167
12. Kelly J.J., and Vanmaekelbergh D. Porous-etched Semiconductors: Formation and Characterization. In: Hodes G. (Ed). Electrochemistry of Nanomaterials (2001), Wiley-VCH, Weinheim 103-136
13. Kelly J.J., Zeger H., and Vanmaekelbergh D. In: Licht S. (Ed). Photoelectrochemical Systems Characterization. Semiconductor Electrodes and Photoelectrochemistry vol. 6 (2002), Wiley-VCH, Weinheim 59-107
14. Lehmann V. Electrochemistry of Silicon (2002), Wiley-VCH, Weinheim
15. Lévy-Clément C. In: Licht S. (Ed). Macroporous Microstructures including Silicon. Semiconductor Electrodes and Photoelectrochemistry vol. 6 (2002), Wiley-VCH, Weinheim 185-237
16. Foll H., Langa S., Carstensen J., Christophersen M., and Tiginyanu I.M. Adv. Mater. 15 (2003) 183
17. Uhlir A. Bell Labs Tech. J. 35 (1956) 333
18. Turner D.R. J. Electrochem. Soc. 105 (1958) 402
19. Archer R.J. J. Phys. Chem. Solids 14 (1960) 104
20. Watanabe Y., and Sakai T. Rev. Elec. Commun. Lab. 19 (1971) 899
21. Watanabe Y., Arita Y., Yokoyama T., and Igarashi Y. J. Electrochem. Soc. 122 (1975) 1351
22. Canham L.T. Adv. Mater. 7 (1995) 1033
23. McCord P., Yau S.L., and Bard A.J. Science 257 (1992) 68
24. Milewski P.D., Lichtenwalner D.J., Mehta P., Kingon A.I., Zhang D., and Kolbas R.M. J. Electron. Mater. 23 (1994) 57
25. Mikulec F.V., Kirtland J.D., and Sailor M.J. Adv. Mater. 14 (2002) 38
26. Herino R., Bomchil G., Barla K., Bertrand C., and Ginoux J.L. J. Electrochem. Soc. 134 (1987) 1994
27. Krumme J.P., and Straumanis M.E. Trans. Metall. Soc. AIME 239 (1967) 395
28. Kohl P.A., Wolowodiuk C., and Ostermayer Jr. F.W. J. Electrochem. Soc. 130 (1983) 2288
29. Faktor M.M., Fiddyment D.G., and Taylor M.R. J. Electrochem. Soc. 122 (1975) 1566
30. Beale M.I.J., Benjamin J.D., Uren M.J., Chew N.G., and Cullis A.G. J. Cryst. Growth 73 (1985) 622
31. Schmuki P., Lockwood D.J., Labbe H.J., and Fraser J.W. Appl. Phys. Lett. 69 (1996) 1620
32. Takizawa T., Arai S., and Nakahara M. Jpn. J. Appl. Phys., Part 2 33 (1994) L643
33. Chase B.D., and Holt D.B. J. Electrochem. Soc. 119 (1972) 314
34. Belogorokhov A., Karavanskii V.A., Obraztsov A.N., and Timoshenko V.Y. J. Exp. Theor. Phys. Lett. 60 (1994) 275
35. Erné B.H., Vanmaekelbergh D., and Kelly J.J. J. Electrochem. Soc. 143 (1996) 305
36. Hongqiang L., Ziming W., and Ishwara B. J. Electrochem. Soc. 144 (1997) L8
37. Peng L.H., Chuang C.W., Ho J.K., Huang C.N., and Chen C.Y. Appl. Phys. Lett. 72 (1998) 939
38. Schmuki P., Santinacci L., Djenizian T., and Lockwood D.J. Phys. Status Solidi A 182 (2000) 51
39. Borini S., Mendez B., and Piqueras J. Semicond. Sci. Technol. 19 (2004) 902
40. Tenne R., and Hodes G. Appl. Phys. Lett. 37 (1980) 428
41. Hodes G. Nature 285 (1980) 29
42. Tenne R. Appl. Phys. 25 (1981) 13
43. Mueller N., and Tenne R. Appl. Phys. Lett. 39 (1981) 283
44. Tenne R. Appl. Phys. Lett. 43 (1983) 201
45. Erné B., Mathieu C., Vigneron J., Million A., and Etcheberry A. J. Electrochem. Soc. 147 (2000) 3759
46. Zenia F., Lévy-Clément C., Triboulet R., Könenkamp R., Ernst K., Saad M., and Lux-Steiner M.C. Appl. Phys. Lett. 75 (1999) 531
47. Miyazaki S., Sakamoto K., Shiba K., and Hirose M. Thin Solid Films 255 (1995) 99
48. Gardelis S., Rimmer J.S., Dawson P., Hamilton B., Kubiak R.A., Whall T.E., and Parker E.H.C. Appl. Phys. Lett. 59 (1991) 2118
49. Schoisswohl M., Cantin J.L., Chamarro M., von Bardeleben H.J., Morgenstern T., Bugiel E., Kissinger W., and Andreu R.C. Phys. Rev. B 52 (1995) 11898
50. Shor J.S., Grimberg I., Weiss B.Z., and Kurtz A.D. Appl. Phys. Lett. 62 (1993) 2836
51. Matsumoto T., Takahashi J., Tamaki T., Futagi T., Mimura H., and Kanemitsu Y. Appl. Phys. Lett. 64 (1994) 226
52. Mimura H., Matsumoto T., and Kanemitsu Y. Appl. Phys. Lett. 65 (1994) 3350
53. Kalkhoran N.M., Namavar F., and Maruska H.P. Appl. Phys. Lett. 63 (1993) 2661
54. Bustarret E., Ligeon M., and Ortega L. Solid State Commun. 83 (1992) 461
55. Wehrspohn R.B., Chazalviel J.N., Ozanam F., and Solomon I. Phys. Rev. Lett. 77 (1996) 1885
56. Komoda T., Sheng X., and Koshida N. J. Vac. Sci. Technol., B 17 (1999) 1076
57. Lharch M., Chazalviel J.N., Ozanam F., Aggour M., and Wehrspohn R.B. Phys. Status Solidi A 197 (2003) 39
58. Frey S., Gesillon B., Ozanam F., Chazalviel J.N., Carstensen J., Foll H., and Wehrspohn R.B. Electrochem. Solid-State Lett. 8 (2005) B25
59. Takasu Y., Konishi S., Sugimoto W., and Murakami Y. Electrochem. Solid-State Lett. 9 (2006) C114
60. Masuda H., and Fukuda K. Science 268 (1995) 1466
61. Kelly J.J. Electrochim. Acta 24 (1979) 1273
62. Zwilling V., and DarqueCeretti E. Ann. Chim. Sci. Mater. 22 (1997) 481
63. Tsuchiya H., Macak J.M., Sieber I., Taveira L., Ghicov A., Sirotna K., and Schmuki P. Electrochem. Commun. 7 (2005) 295
64. Mor G.K., Varghese O.K., Paulose M., Shankar K., and Grimes C.A. Sol. Energy Mater. Sol. Cells 90 (2006) 2011
65. Notten P.H.L., van den Meerakker J.E.A.M., and Kelly J.J. Etching of III-V Semiconductors: An Electrochemical Approach (1991), Elsevier Advanced Technology, Oxford
66. Memming R. Semiconductor Electrochemistry (2000), Wiley-VCH, Weinheim
67. Fuller C.S., and Ditzenberger J.A. J. Appl. Phys. 27 (1956) 544
68. Dimova Malinovska D., Sendova Vassileva M., Tzenov N., and Kamenova M. Thin Solid Films 9 (1997) 297
69. Peng K.-Q., Yan Y.-J., Gao S.-P., and Zhu J. Adv. Mater. 14 (2002) 1164
70. Li X.L., Kim Y.W., Bohn P.W., and Adesida I. Appl. Phys. Lett. 80 (2002) 980
71. Rittenhouse T.L., Bohn P.W., and Adesida I. Solid State Commun. 126 (2003) 245
72. Noguchi N., and Suemune I. Appl. Phys. Lett. 62 (1993) 1429
73. Gerischer H., Allongue P., and Kieling V.C. Ber. Bunsen Ges. Phys. Chem. 97 (1993) 753
74. Gerischer H. Z. Phys. Chem. 26 (1960) 223
75. Gerischer H. Z. Phys. Chem. 26 (1960) 325
76. Gerischer H. Z. Phys. Chem. 27 (1961) 48
77. Schottky W. Naturwissenschaften 26 (1938) 843
78. Marcus R.A. J. Chem. Phys. 24 (1956) 966
79. Marcus R.A. J. Chem. Phys. 43 (1965) 679
80. Kolb D.M., and Gerischer H. Electrochim. Acta 18 (1973) 987
81. Menezes S., Miller B., and Bachmann K.J. J. Vac. Sci. Technol., B 1 (1983) 48
82. Theunissen M.J.J. J. Electrochem. Soc. 119 (1972) 351
83. Zhang X.G. J. Electrochem. Soc. 138 (1991) 3750
84. Searson P.C., Macaulay J.M., and Ross F.M. J. Appl. Phys. 72 (1992) 253
85. Corbett J.W., Shereshevskii D.I., and Verner I.V. Phys. Status Solidi A 147 (1995) 81
86. Schmuki P., Erickson L.E., Lockwood D.J., Fraser J.W., Champion G., and Labbe H.J. Appl. Phys. Lett. 72 (1998) 1039
87. Schmuki P., Erickson L.E., and Lockwood D.J. Phys. Rev. Lett. 80 (1998) 4060
88. Allongue P., Henry-Devilleneuve C., Pinsard L., and Bernard M.C. Appl. Phys. Lett. 67 (1995) 941
89. Allongue P., Costakieling V., and Gerischer H. J. Electrochem. Soc. 140 (1993) 1009
90. Mullins W.W., and Sekerka R.F. J. Appl. Phys. 34 (1963) 323
91. Kang Y., and Jorné J. J. Electrochem. Soc. 140 (1993) 2258
92. Wehrspohn R.B., Ozanam F., and Chazalviel J.N. J. Electrochem. Soc. 146 (1999) 3309
93. Lehmann V., and Foll H. J. Electrochem. Soc. 137 (1990) 653
94. Chazalviel J.N., Wehrspohn R.B., and Ozanam F. Mater. Sci. Eng., B 69 (2000) 1
95. Unagami T. J. Electrochem. Soc. 127 (1980) 476
96. Parkhutik V.P., Albella J.M., Martinez-Duart J.M., Gómez-Rodríguez J.M., Baró A.M., and Shershulsky V.I. Appl. Phys. Lett. 62 (1993) 366
97. Parkhutik V.P., and Shershulsky V.I. J. Phys. D: Appl. Phys. 25 (1992) 1258
98. Venkateswara Rao A., Ozanam F., and Chazalviel J.-N. J. Electrochem. Soc. 138 (1991) 153
99. Belaïdi A., Safi M., Ozanam F., Chazalviel J.-N., and Gorochova O. J. Electrochem. Soc. 146 (1999) 2659
100. Kooij E.S., and Vanmaekelbergh D. J. Electrochem. Soc. 144 (1997) 1296
101. Soares D.M., dos Santos M.C., and Teschke O. Chem. Phys. Lett. 242 (1995) 202
102. Carstensen J., Christophersen M., and Föll H. Mater. Sci. Eng., B 69-70 (2000) 23
103. Memming R., and Schwandt G. Surf. Sci. 4 (1966) 109
104. Lehmann V. J. Electrochem. Soc. 140 (1993) 2836
105. Kang Y., and Jorné J. J. Electrochem. Soc. 144 (1997) 3104
106. Lehmann V., and Rönnebeck S. J. Electrochem. Soc. 146 (1999) 2968
107. Gaspard F., Bsiesy A., Ligeon M., Muller F., and Herino R. J. Electrochem. Soc. 136 (1989) 3043
108. Wehrspohn R.B., Chazalviel J.N., and Ozanam F. J. Electrochem. Soc. 145 (1998) 2958
109. Ponomarev E.A., and Levy-Clement C. Electrochem. Solid-State Lett. 1 (1998) 42
110. Propst E.K., and Kohl P.A. J. Electrochem. Soc. 141 (1994) 1006
111. Rieger M.M., and Kohl P.A. J. Electrochem. Soc. 142 (1995) 1490
112. Smith R.L., Chuang S.F., and Collins S.D. J. Electron. Mater. 17 (1988) 533
113. Witten T.A., and Sander L.M. Phys. Rev. Lett. 47 (1981) 1400
114. Yan H., and Hu X. J. Appl. Phys. 73 (1993) 4324
115. Erlebacher J., Sieradzki K., and Searson P.C. J. Appl. Phys. 76 (1994) 182
116. John G.C., and Singh V.A. Phys. Rev. B 52 (1995) 11125
117. Sing K.S.W. Pure Appl. Chem. 57 (1985) 603
118. Langa S., Tiginyanu I.M., Carstensen J., Christophersen M., and Foll H. Electrochem. Solid-State Lett. 3 (2000) 514
119. Langa S., Tiginyanu I.M., Carstensen J., Christophersen M., and Foll H. Appl. Phys. Lett. 82 (2003) 278
120. Asano T., Higa K., Aoki S., Tonouchi M., and Miyasato T. Jpn. J. Appl. Phys., Part 2 31 (1992) L373
121. Lehmann V., and Gosele U. Mater. Res. Soc. Symp. Proc. (1993) 27
122. Berger M.G., Dieker C., Thonissen M., Vescan L., Luth H., Munder H., Theiss W., Wernke M., and Grosse P. J. Phys. D: Appl. Phys. 27 (1994) 1333
123. Tjerkstra R.W., Rivas J.G., Vanmaekelbergh D., and Kelly J.J. Electrochem. Solid-State Lett. 5 (2002) G32
124. Tsuchiya H., Hueppe M., Djenizian T., and Schmuki P. Surf. Sci. 547 (2003) 268
125. Vincent G. Appl. Phys. Lett. 64 (1994) 2367
126. Arrand H.F., Benson T.M., Loni A., Krueger M.G., Thoenissen M., and Lueth H. Electron. Lett. 33 (1997) 1724
127. Hamamatsu A., Kaneshiro C., Fujikura H., and Hasegawa H. J. Electroanal. Chem. 473 (1999) 223
128. Ross F.M., Oskam G., Searson P.C., Macaulay J.M., and Liddle J.A. Philos. Mag. A 75 (1997) 525
129. Schmuki P., Fraser J., Vitus C.M., Graham M.J., and Isaacs H.S. J. Electrochem. Soc. 143 (1996) 3316
130. Stevens-Kalceff M.A., Tiginyanu I.M., Langa S., Foll H., and Hartnagel H.L. J. Appl. Phys. 89 (2001) 2560
131. Rönnebeck S., Carstensen J., Ottow S., and Foll H. Electrochem. Solid-State Lett. 2 (1999) 126
132. Christophersen M., Carstensen J., Rönnebeck S., Jager C., Jager W., and Foll H. J. Electrochem. Soc. 148 (2001) E267
133. Langa S., Carstensen J., Tiginyanu I.M., Christophersen M., and Foll H. Electrochem. Solid-State Lett. 4 (2001) G50
134. Wloka J., Lockwood D.J., and Schmuki P. Chem. Phys. Lett. 414 (2005) 47
135. Langa S., Carstensen J., Tiginyanu I.M., Christophersen M., and Foll H. Electrochem. Solid-State Lett. 5 (2002) C14
136. Jager C., Finkenberger B., Jager W., Christophersen M., Carstensen J., and Foll H. Mater. Sci. Eng., B 69-70 (2000) 199
137. Langa S., Carstensen J., Christophersen M., Tiginyanu I.M., and Foll H. Phys. Status Solidi A 197 (2003) 186
138. Gonçalves A.-M., Santinacci L., Eb A., Gerard I., Mathieu C., and Etcheberry A. Electrochem. Solid-State Lett. 10 (2007) D35
139. Spiecker E., Rudel M., Jager W., Leisner M., and Foll H. Phys. Status Solidi A 202 (2005) 2950
140. Harvey E., Buckley D.N., and Chu S.N.G. Electrochem. Solid-State Lett. 5 (2002) G22
141. O'Dwyer C., Buckley D.N., and Newcomb S.B. Langmuir 21 (2005) 8090
142. Langa S., Sirbu L., Monaico E., Carstensen J., Foll H., and Tiginyanu I.M. Phys. Status Solidi A 202 (2005) 1411
143. Lehmann V., and Gruning U. Thin Solid Films 297 (1997) 13
144. Rieger M.M., Flake J.C., and Kohl P.A. J. Electrochem. Soc. 146 (1999) 4485
145. Fang C., Foll H., and Carstensen J. Nano Lett. 6 (2006) 1578
146. Konstantinov A.O., Harris C.I., and Janzen E. Appl. Phys. Lett. 65 (1994) 2699
147. Konstantinov A.O., Henry A., Harris C.I., and Janzen E. Appl. Phys. Lett. 66 (1995) 2250
148. Fujikura H., Liu A.M., Hamamatsu A., Sato T., and Hasegawa H. Jpn. J. Appl. Phys., Part 1 39 (2000) 4616
149. Wloka J., Mueller K., and Schmuki P. Electrochem. Solid-State Lett. 8 (2005) B72
150. Zeng A.S., Zheng M.J., Ma L., and Shen W.Z. Nanotechnology 17 (2006) 4163
151. Schmuki P., Santinacci L., Lockwood D.J., and Graham M.J. Phys. Status Solidi A 197 (2003) 71
152. Harvey E., Buckley D.N., Chu S.N.G., Sutton D., and Newcomb S.B. J. Electrochem. Soc. 149 (2002) B398
153. Oskam G., Natarajan A., Searson P.C., and Ross F.M. Appl. Surf. Sci. 119 (1997) 160
154. Morishita Y., Kawai S., and Sunagawa J. Jpn. J. Appl. Phys., Part 2 38 (1999) 1156
155. Tiginyanu I.M., Ursaki V.V., Monaico E., Foca E., and Foll H. Electrochem. Solid-State Lett. 10 (2007) D127
156. Ulin V.P., and Konnikov S.G. Semiconductors 41 (2007) 832
157. Erné B.H., Vanmaekelbergh D., and Kelly J.J. Adv. Mater. 7 (1995) 739
158. Wloka J., and Schmuki P. J. Electroceram. 16 (2006) 23
159. Schuurmans F.J.P., Vanmaekelbergh D., van de Lagemaat J., and Lagendijk A. Science 284 (1999) 141
160. J. van de Lagemaat, Electrochemistry of large bandgap chemically resistant semiconductors, Utrecht University, Utrecht, 1998.
161. Youtsey C., Romano L.T., and Adesida I. Appl. Phys. Lett. 73 (1998) 797
162. O'Dwyer C., Buckley D.N., Sutton D., and Newcomb S.B. J. Electrochem. Soc. 153 (2006) G1039
163. Erné B.H., Million A., Vigneron J., Mathieu C., Debiemme-Chouvy C., and Etcheberry A. Electrochem. Solid-State Lett. 2 (1999) 619
164. Doan V.V., and Sailor M.J. Appl. Phys. Lett. 60 (1992) 619
165. Christophersen M., Carstensen J., Feuerhake A., and Föll H. Mater. Sci. Eng., B 69-70 (2000) 194
166. Song J.H., and Sailor M.J. Inorg. Chem. 37 (1998) 3355
167. Fang C., Föll H., Carstensen J., and Langa S. Phys. Status Solidi A 204 (2003) 1292
168. Anedda A., Serpi A., Karavanskii V.A., Tiginyanu I.M., and Ichizli V.M. Appl. Phys. Lett. 67 (1995) 3316
169. Goncalves A.M., Santinacci L., Eb A., David C., Mathieu C., Herlem M., and Etcheberry A. Phys. Status Solidi A 204 (2007) 1286
170. Goncalves A.-M., Seitz O., Mathieu C., Herlem M., and Etcheberry A. Electrochem. Commun. 10 (2008) 225
171. Foll H., Carstensen J., Langa S., Christophersen M., and Tiginyanu I.M. Phys. Status Solidi A 197 (2003) 61
172. Langa S., Christophersen M., Carstensen J., Tiginyanu I.M., and Foll H. Phys. Status Solidi A 195 (2003) R4
173. O'Dwyer C., Buckley D.N., Sutton D., Serantoni M., and Newcomb S.B. J. Electrochem. Soc. 154 (2007) H78
174. Langa S., Carstensen J., Christophersen M., Steen K., Frey S., Tiginyanu I.M., and Foll H. J. Electrochem. Soc. 152 (2005) C525
175. Lehmann V., Stengl R., and Luigart A. Mater. Sci. Eng., B 69-70 (2000) 11
176. Taketomo S., Toshiyuki F., and Tamotsu H. Electrochem. Solid-State Lett. 10 (2007) H153
177. Fujino T., Sato T., and Hashizume T. Jpn. J. Appl. Phys., Part 1 46 (2007) 4375
178. Schilling J., Muller F., Matthias S., Wehrspohn R.B., Gosele U., and Busch K. Appl. Phys. Lett. 78 (2001) 1180
179. Djenizian T., Santinacci L., Hildebrand H., and Schmuki P. Surf. Sci. 524 (2003) 40
180. Takizawa T., Nakahara M., Kikuno E., and Arai S. J. Electron. Mater. 25 (1996) 657
181. Foll H., Langa S., Carstensen J., Christophersen M., and Tiginyanu I.M. The Way to Uniformity in Porous III-V Compounds via Self-organization and Lithography Patterning. In: Wehrspohn R.B. (Ed). Ordered Porous Nanostructures and Applications (2005), Springer, Berlin
182. Carrabba M.M., Nguyen N.M., and Rauh R.D. J. Electrochem. Soc. 134 (1987) 1855
183. Schmuki P., and Erickson L.E. Appl. Phys. Lett. 73 (1998) 2600
184. Schlierf U., Champion G., Sproule G.I., Moisa S., Fraser J.W., Graham M.J., and Schmuki P. Phys. Status Solidi A 197 (2003) 180
185. Santinacci L., Djenizian T., and Schmuki P. J. Electrochem. Soc. 148 (2001) C640
186. Schmuki P., Schlierf U., Herrmann T., and Champion G. Electrochim. Acta 48 (2003) 1301
187. Seo M., and Yamaya T. Electrochim. Acta 51 (2005) 787
188. Ke Y., Devaty R.P., and Choyke W.J. Electrochem. Solid-State Lett. 10 (2007) K24
189. Hirschman K.D., Tsybeskov L., Duttagupta S.P., and Fauchet P.M. Nature 384 (1996) 338
190. Menna P., Di Francia G., and La Ferrara V. Sol. Energy Mater. Sol. Cells 37 (1995) 13
191. Shin H.-C., Corno J.A., Gole J.L., and Liu M. J. Power Sources 139 (2005) 314
192. Striemer C.C., Gaborski T.R., McGrath J.L., and Fauchet P.M. Nature 445 (2007) 749
193. Araki M., Koyama H., and Koshida N. Appl. Phys. Lett. 69 (1996) 2956
194. Mulloni V., and Pavesi L. Appl. Phys. Lett. 76 (2000) 2523
195. Lin V.S.Y., Motesharei K., Dancil K.-P.S., and Sailor M.J. Science 278 (1997) 840
196. Tsuchiya H., Hueppe M., Djenizian T., Schmuki P., and Fujimotoa S. Sci. Technol. Adv. Mater. 5 (2004) 119
197. Langa S., Carstensen J., Christophersen M., Foll H., and Tiginyanu I.M. Appl. Phys. Lett. 78 (2001) 1074
198. Zheng J., Christophersen M., and Bergstrom P.L. Phys. Status Solidi A 202 (2005) 1662
199. Harraz F.A., Kamada K., Kobayashi K., Sakka T., and Ogata Y.H. J. Electrochem. Soc. 152 (2005) C213