Self-induced voltage oscillations during anodic etching of n-InP and possible applications for three-dimensional microstructures

Electrochemical and Solid-State Letters

Volumn 4, Issue 6, 2001, Pages

  Langa, S ^a,b   Carstensen, J ^a   Tiginyanu, I M ^b   Christophersen, M ^a   Foll H ^a  

^a UNIVERSITY OF KIEL   (Germany)

^b INSTITUTE OF APPLIED PHYSICS   (Moldova)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CURRENT DENSITY; ELECTRON DEVICE MANUFACTURE; ETCHING; HYDROCHLORIC ACID; MODULATION; OPTICAL DESIGN; OSCILLATIONS; PHOTOLUMINESCENCE; POROSITY; THREE DIMENSIONAL; THRESHOLD VOLTAGE;

ANODIC ETCHING; PHOTONIC MATERIALS; SELF INDUCED VOLTAGE OSCILLATIONS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0035383708     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1370417     Document Type: Article

References (13)