Catalysis and pore initiation in the anodic dissolution of silicon in HF

Journal of the Electrochemical Society

Volumn 144, Issue 4, 1997, Pages 1296-1301

  Kooij, E S ^a   Vanmaekelbergh, D ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; HYDROFLUORIC ACID; HYDROGEN; PHOTOCHEMICAL REACTIONS; PHOTOCONDUCTIVITY; SILICON;

ANODIC DISSOLUTION; PHOTOCURRENT; QUANTUM YIELD;

ANODIC OXIDATION;

EID: 0031121782     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837587     Document Type: Article

References (34)

1. R. Memming and G. Schwandt, Surf. Sci., 4, 109 (1966).
2. M. Matsumura and S. R. Morrison, J. Electroanal. Chem., 147, 157 (1983).
3. H. Gerischer and M. Lübke, Ber. Bunsenges. Phys. Chem., 91, 394 (1987).
4. H. J. Lewerenz, J. Stumper, and L. M. Peter, Phys. Rev. Lett., 61, 1989 (1988).
5. K. Gerischer and M. Lübke, This Journal, 135, 2782 (1988).
6. L. M. Peter, D. J. Blackwood, and S. Pons, Phys. Rev. Lett., 62, 308 (1989).
7. J. Stumper, H. J. Lewerenz, and C. Pettenkofer, Phys. Rev. B, 41, 1592 (1990).
8. M. J. Eddowes, J. Electroanal. Chem., 280, 297 (1990).
9. L. M. Peter, A. M. Borazio, H. J. Lewerenz, and J. Stumper, ibid., 290, 229 (1990).
10. L. M. Peter, D. J. Blackwood, and S. Pons, ibid., 294, 111 (1990).
11. L. T. Canham, Appl. Phys. Lett., 57, 1046 (1990).
12. A. Venkateswara Rao, F. Ozanam, and J.-N. Chazalviel, This Journal, 138, 153 (1991).
13. V. Lehmann and U. Gösele, Appl. Phys. Lett., 58, 856 (1991).
14. J. Stumper and L. M. Peter, J. Electroanal. Chem., 309, 325 (1991).
15. X. G. Zhang, This Journal, 138, 3750 (1991).
16. C. Lévy-Clément, A. Lagoubi, R. Tenne, and M. Neumann-Spallart, Electrochim. Acta, 37, 877 (1992).
17. D. J. Blackwood, A. Borazio, R. Greef, L. M. Peter, and J. Stumper, ibid., 37, 889 (1992).
18. R. L. Smith and S. D. Collins, J. Appl. Phys. 71, R1 (1992).
19. P. C. Searson, J. J. Macauley, and F. M. Ross, ibid., 72, 253 (1992).
20. P. C. Searson, J. M. Macauley, and S. M. Prokes, This Journal, 139, 3373 (1992).
21. E. Propst and P. A. Kohl, ibid., 140, L78 (1993).
22. H. Gerischer, P. Allongue, and V. C. Kieling, Ber. Bunsenges. Phys. Chem., 97, 753 (1993).
23. C. Lévy-Clément, A. Lagoubi, and M. Tomkiewicz, This Journal, 141, 958 (1994).
24. St. Frohnhoff, M. Marso, M. G. Berger, M. Thónissen, H. Lüth, and H. Münder, ibid., 142, 615 (1995).
25. M. M. Rieger and P. A. Kohl, ibid., 142, 1490 (1995).
26. P. Allongue, C. H. de Villeneuve, L. Pinsard, and M. C. Bernard, Appl. Phys. Lett., 67, 941 (1995).
27. A. Valance, Phys. Rev. B, 52, 8323 (1995).
28. G. C. John and V. A. Singh, ibid., 52, 11125 (1995).
29. P. M. M. C. Bressers, J. W. J. Knapen, E. A. Meulenkamp, and J. J. Kelly, Appl. Phys. Lett., 61, 108 (1992).
30. L. T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, ibid., 61, 2503 (1992).
31. D. Vanmaekelbergh and W. P. Gomes, J. Phys. Chem., 94, 1571 (1990).
32. A. R. de Wit, D. Vanmaekelbergh, and J. J. Kelly, This Journal, 139, 2508 (1992).
33. B. H. Erné, D. Vanmaekelbergh, and I. E. Vermeir, Electrochim. Acta, 38, 2259 (1993).
34. G. H. Schoenmakers, R. Waagenaar, and J. J. Kelly, This Journal, 142, L60 (1995).