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Volumn 8, Issue 12, 2005, Pages

Pore morphology and self-organization effects during etching of n-type GaP(100) in bromide solutions

Author keywords

[No Author keywords available]

Indexed keywords

BROMIDE SOLUTIONS; PORE MORPHOLOGY; POTENTIOSTATIC CONDITIONS; SELF-ORGANIZATION EFFECTS;

EID: 28044466904     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2103507     Document Type: Article
Times cited : (28)

References (24)
  • 12
    • 0003494870 scopus 로고
    • J. L. Vossen and W. Kern Editors, Academic Press, New York
    • W. Kern and Ch. A. Deckert, in Thin Film Processes, J. L. Vossen and W. Kern Editors, Academic Press, New York (1978).
    • (1978) Thin Film Processes
    • Kern, W.1    Deckert, C.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.