The limits of macropore array fabrication

Thin Solid Films

Volumn 297, Issue 1-2, 1997, Pages 13-17

  Lehmann, V ^a   Gruning U ^a  

^a SIEMENS AG   (Germany)

Author keywords

Electrochemical etching; Macropore array fabrication

Indexed keywords

ANODIC OXIDATION; ARRAYS; ASPECT RATIO; CURRENT DENSITY; ELECTROCHEMISTRY; ETCHING; FABRICATION; HYDROFLUORIC ACID; MORPHOLOGY; TEMPERATURE;

ELECTROCHEMICAL ETCHING; MACROPORE ARRAY FABRICATION;

POROUS SILICON;

EID: 0031121457     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09478-3     Document Type: Article

References (4)

1. V. Lehmann and H. Föll, J. Electrochem. Soc., 137 (1990) 653.
2. V. Lehmann, W. Hönlein, H. Reisinger, A. Spitzer, H. Wendt and J. Willer, Solid State Technol., 38 (1995) 99.
3. U. Grüning, V. Lehmann, S. Ottow and K. Busch, Appl. Phys. Lett., 68 (1996) 747.
4. V. Lehmann, J. Electrochem. Soc., 140 (1990) 2836.