Origins of cracking in highly porous anodically grown films on InP

Journal of the Electrochemical Society

Volumn 149, Issue 9, 2002, Pages

  Harvey, E ^a   Buckley, D N ^a   Chu, S N G ^b   Sutton, D ^a   Newcob, S B ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ANODES; CRACK INITIATION; CURRENT DENSITY; ELECTRIC CHARGE; ELECTROCHEMISTRY; FILM GROWTH; METALLIC FILMS; MORPHOLOGY; POROSITY; SURFACE PROPERTIES; THICKNESS MEASUREMENT;

ANODIZATION; CHARGE DENSITY; ELECTROCHEMICAL TREATMENT; INDIUM PHOSPHIDE;

INDIUM ALLOYS;

EID: 0036748565     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1497401     Document Type: Article

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