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Volumn 69, Issue , 2000, Pages 23-28
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Pore formation mechanisms for the Si-HF system
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL ORIENTATION;
DISSOLUTION;
ELECTRIC SPACE CHARGE;
ELECTROCHEMICAL ELECTRODES;
INTERFACES (MATERIALS);
NUCLEATION;
REACTION KINETICS;
SEMICONDUCTOR DEVICE MODELS;
SEMICONDUCTOR JUNCTIONS;
SYNCHRONIZATION;
ENHANCED NUCLEATION PROBABILITIES;
SELF-ORGANIZED PROCESSES;
SILICON ELECTROCHEMISTRY;
SEMICONDUCTING SILICON;
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EID: 0033874829
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(99)00287-1 Document Type: Article |
Times cited : (146)
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References (26)
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