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Volumn 69, Issue , 2000, Pages 23-28

Pore formation mechanisms for the Si-HF system

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DISSOLUTION; ELECTRIC SPACE CHARGE; ELECTROCHEMICAL ELECTRODES; INTERFACES (MATERIALS); NUCLEATION; REACTION KINETICS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR JUNCTIONS; SYNCHRONIZATION;

EID: 0033874829     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00287-1     Document Type: Article
Times cited : (146)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.