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Electrochemical and Solid-State Letters

Volumn 10, Issue 4, 2007, Pages

Pore formation on n-InP(100) in acidic liquid ammonia at 223 K: A true water-free etching process

(6) Gonalves A M a Santinacci, L a,b Eb, A a Gerard, I a Mathieu, C a Etcheberry, A a,b

a UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES (France)

b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ACIDITY; AMMONIA; ELECTROLYTES; ETCHING; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SURFACE PHENOMENA;

CONSTANT PORE DEPTH; GALVANOSTATIC TREATMENTS; PORE FORMATION; PORE MORPHOLOGY;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 33846987569 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2434201 Document Type: Article

Times cited : (50)

References (27)

1
- 0037419660
- H. Föll, S. Langa, and J. Carstensen, Adv. Mater. (Weinheim, Ger.), 15, 183 (2003).
- (2003) Adv. Mater. (Weinheim, Ger.) , vol.15 , pp. 183
- Föll, H.¹ Langa, S.² Carstensen, J.³

2
- 0028441656
- T. Takizawa, S. Arai, and M. Masafumi, Jpn. J. Appl. Phys., Part 1, 33, L643 (1994).
- (1994) Jpn. J. Appl. Phys., Part 1 , vol.33 , pp. 643
- Takizawa, T.¹ Arai, S.² Masafumi, M.³

3
- 0033345111
- A. Hamamatsu, C. Kaneshiro, H. Fujikura, and H. Hasegawa, J. Electroanal. Chem., 473, 223 (1999).
- (1999) J. Electroanal. Chem. , vol.473 , pp. 223
- Hamamatsu, A.¹ Kaneshiro, C.² Fujikura, H.³ Hasegawa, H.⁴

4
- 0037434285
- S. Langa, I. M. Tiginyany, J. Carstensen, M. Christophersen, and H. Föll, Appl. Phys. Lett., 82, 278 (2003).
- (2003) Appl. Phys. Lett. , vol.82 , pp. 278
- Langa, S.¹ Tiginyany, I.M.² Carstensen, J.³ Christophersen, M.⁴ Föll, H.⁵

5
- 0034430314
- P. Schmuki, L. Santinacci, T. Djenizian, and D. J. Lockwood, Phys. Status Solidi A, 182, 51 (2000).
- (2000) Phys. Status Solidi A , vol.182 , pp. 51
- Schmuki, P.¹ Santinacci, L.² Djenizian, T.³ Lockwood, D.J.⁴

6
- 0038469969
- M. Christophersen, J. Carstensen, K. Voigt, and H. Föll, Phys. Status Solidi A, 197, 34 (2003).
- (2003) Phys. Status Solidi A , vol.197 , pp. 34
- Christophersen, M.¹ Carstensen, J.² Voigt, K.³ Föll, H.⁴

7
- 0036836993
- H. Föll, M. Christophersen, J. Carstensen, and G. Hasse, Mater. Sci. Eng., R., 39, 93 (2002).
- (2002) Mater. Sci. Eng., R. , vol.39 , pp. 93
- Föll, H.¹ Christophersen, M.² Carstensen, J.³ Hasse, G.⁴

8
- 0033534973
- A.-M. Goņalves, C. Mathieu, M. Herlem, and A. Etcheberry, J. Electroanal. Chem., 462, 88 (1999).
- (1999) J. Electroanal. Chem. , vol.462 , pp. 88
- Goņalves, A.-M.¹ Mathieu, C.² Herlem, M.³ Etcheberry, A.⁴

9
- 0031095528
- A. Etcheberry, A.-M. Goņalves, C. Mathieu, and M. Herlem, J. Electrochem. Soc., 144, 928 (1997).
- (1997) J. Electrochem. Soc. , vol.144 , pp. 928
- Etcheberry, A.¹ Goņalves, A.-M.² Mathieu, C.³ Herlem, M.⁴

10
- 21544444504
- M. I. J. Beale, J. D. Benjamin, M. J. Uren, N. G. Chew, and A. G. Cullis, J. Cryst. Growth, 73, 622 (1985).
- (1985) J. Cryst. Growth , vol.73 , pp. 622
- Beale, M.I.J.¹ Benjamin, J.D.² Uren, M.J.³ Chew, N.G.⁴ Cullis, A.G.⁵

11
- 51249176460
- R. L. Smith, S.-F. Chuang, and S. D. Collins, J. Electron. Mater., 17, 533 (1988).
- (1988) J. Electron. Mater. , vol.17 , pp. 533
- Smith, R.L.¹ Chuang, S.-F.² Collins, S.D.³

12
- 0033874829
- J. Carstensen, M. Christophersen, and H. Föll, Mater. Sci. Eng., B, 69-70, 23 (2000).
- (2000) Mater. Sci. Eng., B , vol.69-70 , pp. 23
- Carstensen, J.¹ Christophersen, M.² Föll, H.³

13
- 0004206906
- Friedr. Vieweg & Sohn, Braunschweig
- See, for example, J. Jander, Anorganische und Allgemeine Chemie in Flüssigen Ammoniak. Part I, Friedr. Vieweg & Sohn, Braunschweig (1966).
- (1966) Anorganische und Allgemeine Chemie in Flüssigen Ammoniak. Part i
- Jander, J.¹

14
- 0024011946
- D. Guyomard, C. Mathieu, and M. Herlem, J. Electroanal. Chem. Interfacial Electrochem., 246, 29 (1988).
- (1988) J. Electroanal. Chem. Interfacial Electrochem. , vol.246 , pp. 29
- Guyomard, D.¹ Mathieu, C.² Herlem, M.³

15
- 0142021048
- O. Seitz, C. Mathieu, A.-M. Goņalves, M. Herlem, and A. Etcheberry, J. Electrochem. Soc., 150, E461 (2003).
- (2003) J. Electrochem. Soc. , vol.150 , pp. 461
- Seitz, O.¹ Mathieu, C.² Goņalves, A.-M.³ Herlem, M.⁴ Etcheberry, A.⁵

16
- 0029695828
- I. Ǵrard, F. Iranzo-Marín, J. Vigneron, and A. Etcheberry, J. Electroanal. Chem., 401, 57 (1996).
- (1996) J. Electroanal. Chem. , vol.401 , pp. 57
- Ǵrard, I.¹ Iranzo-Marín, F.² Vigneron, J.³ Etcheberry, A.⁴

17
- 0003834545
- Elsevier, Amsterdam
- P. H. L. Noten, J. E. A. M. Van den Meeraker, and J. J. Kelly, Etching of III-V Semiconductors: An Electrochemical Approach, Elsevier, Amsterdam (1991).
- (1991) Etching of III-V Semiconductors: An Electrochemical Approach
- Noten, P.H.L.¹ Van Den Meeraker, J.E.A.M.² Kelly, J.J.³

18
- 0034294431
- B. H. Erń, C. Mathieu, J. Vigneron, A. Millon, and A. Etcheberry, J. Electrochem. Soc., 147, 3759 (2000).
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3759
- Erń, B.H.¹ Mathieu, C.² Vigneron, J.³ Millon, A.⁴ Etcheberry, A.⁵

19
- 0002430973
- A. Liu and C. Duan, Appl. Phys. Lett., 78, 43 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 43
- Liu, A.¹ Duan, C.²

20
- 21544438532
- 0021-8979 10.1063/1.1708984
- D. B. Wittry and D. F. Kyser, J. Appl. Phys. 0021-8979 10.1063/1.1708984, 38, 375 (1967); U. Langmann, Appl. Phys. 0340-3793 10.1007/BF00884672, 1, 219 (1973); K. Mettler, Appl. Phys. 0340-3793 10.1007/BF00900071, 12, 75 (1977); K. Ando, A. Yamamoto, and M. Yamaguchi, J. Appl. Phys. 0021-8979 10.1063/1.327595, 51, 6432 (1980); R. E. Hollingsworth and J. R. Sites, J. Appl. Phys., 53, 5357 (1982).
- (1967) J. Appl. Phys. , vol.38 , pp. 375
- Wittry, D.B.¹ Kyser, D.F.²

21
- 0010069113
- 0340-3793 10.1007/BF00884672
- D. B. Wittry and D. F. Kyser, J. Appl. Phys. 0021-8979 10.1063/1.1708984, 38, 375 (1967); U. Langmann, Appl. Phys. 0340-3793 10.1007/BF00884672, 1, 219 (1973); K. Mettler, Appl. Phys. 0340-3793 10.1007/BF00900071, 12, 75 (1977); K. Ando, A. Yamamoto, and M. Yamaguchi, J. Appl. Phys. 0021-8979 10.1063/1.327595, 51, 6432 (1980); R. E. Hollingsworth and J. R. Sites, J. Appl. Phys., 53, 5357 (1982).
- (1973) Appl. Phys. , vol.1 , pp. 219
- Langmann, U.¹

22
- 0017438776
- 0340-3793 10.1007/BF00900071
- D. B. Wittry and D. F. Kyser, J. Appl. Phys. 0021-8979 10.1063/1.1708984, 38, 375 (1967); U. Langmann, Appl. Phys. 0340-3793 10.1007/BF00884672, 1, 219 (1973); K. Mettler, Appl. Phys. 0340-3793 10.1007/BF00900071, 12, 75 (1977); K. Ando, A. Yamamoto, and M. Yamaguchi, J. Appl. Phys. 0021-8979 10.1063/1.327595, 51, 6432 (1980); R. E. Hollingsworth and J. R. Sites, J. Appl. Phys., 53, 5357 (1982).
- (1977) Appl. Phys. , vol.12 , pp. 75
- Mettler, K.¹

23
- 0242496608
- 0021-8979 10.1063/1.327595
- D. B. Wittry and D. F. Kyser, J. Appl. Phys. 0021-8979 10.1063/1.1708984, 38, 375 (1967); U. Langmann, Appl. Phys. 0340-3793 10.1007/BF00884672, 1, 219 (1973); K. Mettler, Appl. Phys. 0340-3793 10.1007/BF00900071, 12, 75 (1977); K. Ando, A. Yamamoto, and M. Yamaguchi, J. Appl. Phys. 0021-8979 10.1063/1.327595, 51, 6432 (1980); R. E. Hollingsworth and J. R. Sites, J. Appl. Phys., 53, 5357 (1982).
- (1980) J. Appl. Phys. , vol.51 , pp. 6432
- Ando, K.¹ Yamamoto, A.² Yamaguchi, M.³

24
- 0020163211
- D. B. Wittry and D. F. Kyser, J. Appl. Phys. 0021-8979 10.1063/1.1708984, 38, 375 (1967); U. Langmann, Appl. Phys. 0340-3793 10.1007/BF00884672, 1, 219 (1973); K. Mettler, Appl. Phys. 0340-3793 10.1007/BF00900071, 12, 75 (1977); K. Ando, A. Yamamoto, and M. Yamaguchi, J. Appl. Phys. 0021-8979 10.1063/1.327595, 51, 6432 (1980); R. E. Hollingsworth and J. R. Sites, J. Appl. Phys., 53, 5357 (1982).
- (1982) J. Appl. Phys. , vol.53 , pp. 5357
- Hollingsworth, R.E.¹ Sites, J.R.²

25
- 0242496614
- 0003-6951 10.1063/1.95494
- A. Etcheberry, J. Gautron, and J. l. Sculfort, Appl. Phys. Lett. 0003-6951 10.1063/1.95494, 46, 744 (1985); B. Smandek, G. Chmiel, and H. Gerischer, Ber. Bunsenges. Phys. Chem., 93, 1094 (1989).
- (1985) Appl. Phys. Lett. , vol.46 , pp. 744
- Etcheberry, A.¹ Gautron, J.² Sculfort, J.L.³

26
- 0024753316
- A. Etcheberry, J. Gautron, and J. l. Sculfort, Appl. Phys. Lett. 0003-6951 10.1063/1.95494, 46, 744 (1985); B. Smandek, G. Chmiel, and H. Gerischer, Ber. Bunsenges. Phys. Chem., 93, 1094 (1989).
- (1989) Ber. Bunsenges. Phys. Chem. , vol.93 , pp. 1094
- Smandek, B.¹ Chmiel, G.² Gerischer, H.³

27
- 33847596250
- D. E. Aspnes and A. A. Studna, Phys. Rev. B, 27, 985 (1983).
- (1983) Phys. Rev. B , vol.27 , pp. 985
- Aspnes, D.E.¹ Studna, A.A.²

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