Macropore formation in highly resistive p-type crystalline silicon

Journal of the Electrochemical Society

Volumn 145, Issue 8, 1998, Pages 2958-2961

  Wehrspohn, R B ^a   Chazalviel, J N ^a,b   Ozanam, F ^a  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANODIC OXIDATION; CRYSTALLINE MATERIALS; DISSOLUTION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC SPACE CHARGE; ELECTROCHEMICAL ELECTRODES; HYDROFLUORIC ACID; HYDROGENATION; MORPHOLOGY; POROSITY;

LINEAR STABILITY ANALYSIS;

SEMICONDUCTING SILICON;

EID: 0032141930     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838744     Document Type: Article

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