Direct micropatterning of Si and GaAs using electrochemical development of focused ion beam implants

Applied Physics Letters

Volumn 73, Issue 18, 1998, Pages 2600-2602

  Schmuki, P ^a   Erickson, L E ^b  

^a EPFL   (Switzerland)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007406075     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122518     Document Type: Article

References (15)

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