Long germanium nanowires prepared by electrochemical etching

Nano Letters

Volumn 6, Issue 7, 2006, Pages 1578-1580

  Fang, C ^a   Foll H ^a   Carstensen, J ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTROCHEMISTRY; ETCHING; GERMANIUM; LEAKAGE CURRENTS; MICROMETERS; OPTIMIZATION;

CONSTANT DISSOLUTION; ELECTROCHEMICAL ETCHING; GERMANIUM NANOWIRES; PORE WALLS;

NANOSTRUCTURED MATERIALS;

GERMANIUM; NANOMATERIAL;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMISTRY; SURFACE PROPERTY;

ELECTROCHEMISTRY; GERMANIUM; MICROSCOPY, ATOMIC FORCE; NANOSTRUCTURES; SURFACE PROPERTIES;

EID: 33746915095     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl061060r     Document Type: Article

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