On the morphology and the electrochemical formation mechanism of mesoporous silicon

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 11-22

  Lehmann, V ^a   Stengl, R ^a   Luigart, A ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Mesopore formation; Mesoporous silicon; Silicon electrode

Indexed keywords

CHARGE CARRIERS; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC SPACE CHARGE; ELECTROCHEMICAL ELECTRODES; MORPHOLOGY; POROUS SILICON; SEMICONDUCTOR DOPING; SUBSTRATES;

CHARGE CARRIER TUNNELING; MESOPOROUS SILICON; SILICON ELECTRODES;

SEMICONDUCTING SILICON;

EID: 0033882318     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00286-X     Document Type: Article

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