Plasma assisted techniques for deposition of superhard nanocomposite coatings

Surface and Coatings Technology

Volumn 201, Issue 13, 2007, Pages 6071-6077

  Levchuk, Denis ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Plasma assisted CVD; Sputtering; Superhard nanocomposite coatings; Vacuum arc

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HARDNESS; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS;

PLASMA ASSISTED PHYSICAL VAPOR DEPOSITION; SUPERHARD NANOCOMPOSITE COATINGS; VACUUM ARC; WORKING GAS PRESSURE;

SPUTTER DEPOSITION;

CHEMICAL VAPOR DEPOSITION; HARDNESS; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; SPUTTER DEPOSITION;

EID: 33846821816     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.113     Document Type: Article

References (109)

1. Musil J., Karvánková P., and Kasl J. Surf. Coat. Technol. 139 (2001) 101
2. Voevodin A.A., O'Neill J.P., and Zabinski J.S. Surf. Coat. Technol. 116-119 (1999) 36
3. Veprek S., Niederhofer A., Moto K., Bolom T., Männling H.-D., Nesladek P., Dollinger G., and Bergmaier A. Surf. Coat. Technol. 133-134 (2000) 152
4. Karvankova P., Veprek-Heijman M.G.J., Zindulka O., Bergmaier A., and Veprek S. Surf. Coat. Technol. 163-164 (2003) 149
5. Procházka J., Korvánková P., Vepøek-Heijman M.G.J., and Vepøek S. Mater. Sci. Eng., A 384 (2004) 102
6. Veprek S., Männling H.-D., Karvankova P., and Prochazka J. Surf. Coat. Technol. 200 (2006) 3876
7. Andrievski R.A. Int. J. Refract. Met. Hard Mater. 19 (2001) 447
8. Andrievski R.A. J. Mater. Sci. 38 (2003) 1367
9. Bai X., Zheng W., and An T. Prog. Nat. Sci. 15 (2005) 97
10. Zhang S., Sun D., Fu Y., and Du H. Surf. Coat. Technol. 167 (2003) 113
11. Veprek S., and Reiprich S. Thin Solid Films 268 (1995) 64
12. Vepřek S. J. Vac. Sci. Technol., A 17 (1999) 2401
13. Veprek S., Veprek-Heijman M.G.J., Karvankova P., and Prochazka J. Thin Solid Films 476 (2005) 1
14. Veprek S., and Jilek M. Pure Appl. Chem. 74 3 (2002) 475
15. Li S.Z., Shi Y.L., and Peng H.R. Plasma Chem. Plasma Process. 12 (1992) 287
16. Veprek S., Reiprich S., and Shizhi L. Appl. Phys. Lett. 66 (1995) 2640
17. Niederhofer A., Nesladek P., Männling H.-D., Moto K., Veprek S., and Jilek M. Surf. Coat. Technol. 120-121 (1999) 173
18. Veprek S., and Argon A.S. Surf. Coat. Technol. 146-147 (2001) 175
19. Männling H.-D., Patil D.S., Moto K., Jilek M., and Veprek S. Surf. Coat. Technol. 146-147 (2001) 263
20. Mollart T.P., Baker M., Haupt J., Steiner A., Hammer P., and Gissler W. Surf. Coat. Technol. 74-75 (1995) 491
21. Wiedemann R., Weihnacht V., and Oettel H. Surf. Coat. Technol. 116-119 (1999) 302
22. Rebholz C., Schneider M., Voevodin A., Steinebrunner J., Charitidis C., Logothetidis S., Leyland A., and Matthews A. Surf. Coat. Technol. 113 (1999) 126
23. Musil J. Surf. Coat. Technol. 125 (2000) 322
24. Karvankova P., Männling H.-D., Eggs Ch., and Veprek S. Surf. Coat. Technol. 146-147 (2001) 280
25. Mitterer C., Mayrhofer P.H., Beschliesser M., Losbichler P., Warbichler P., Hofer F., Gibson P.N., Gissler W., Hruby H., Musil J., and Vlček J. Surf. Coat. Technol. 120-121 (1999) 405
26. Willmott P.R., and Huber J.R. Rev. Mod. Phys. 72 (2000) 315
27. Šikola T., Spousta J., Dittrichová L., Nebojsa A., Peřina V., Češka R., and Dub P. Surf. Coat. Technol. 84 (1996) 485
28. Meldrum A., and Boatner L.A. Nucl. Instrum. Methods Phys. Res., B Beam Interact. Mater. Atoms 178 (2001) 7
29. Benda M., and Musil J. Vacuum 55 (1999) 171
30. Jones J.G., and Voevodin A.A. Surf. Coat. Technol. 184 (2004) 1
31. Voevodin A.A., and Zabinski J.S. Compos. Sci. Technol. 65 (2005) 741
32. Voevodin A.A., Zabinski J.S., and Muratore C. Tsinghua Sci. Technol. 10 (2005) 665
33. Li Z.G., He J.L., Matsumoto T., Mori T., Miyake S., and Muramatsu Y. Surf. Coat. Technol. 174-175 (2003) 1140
34. Mitterer C., Holler F., Reitberger D., Badish E., Stoiber M., Lugmair C., Nöbauer R., Müller Th., and Kullmer R. Surf. Coat. Technol. 163-164 (2003) 716
35. Hochreiter R., Laimer J., Störi H., and Heim D. Surf. Coat. Technol. 74-75 (1995) 443
36. Mitterer C., Holler F., Lugmair C., Nöbauer R., Kullmer R., and Teichert C. Surf. Coat. Technol. 142-144 (2001) 1005
37. Vepřek S. Thin Solid Films 317 (1999) 449
38. Lee E.-A., and Kim K.H. Thin Solid Films 420-421 (2002) 371
39. Ma D., Ma S., and Xu K. Surf. Coat. Technol. 200 (2005) 382
40. Han D.-S., Song P.K., Cho K.-M., Park Y.H., and Kim K.H. Surf. Coat. Technol. 188-189 (2004) 446
41. Badisch E., Stoiber M., Fontalvo G.A., and Mitterer C. Surf. Coat. Technol. 174-175 (2003) 450
42. Stoiber M., Perlot S., Mitterer C., Beschliesser M., Lugmair C., and Kullmer R. Surf. Coat. Technol. 177-178 (2004) 348
43. Karvankova P., Veprek-Heijman M.G.J., Azinovic D., and Veprek S. Surf. Coat. Technol. 200 (2006) 2978
44. Musil J., Baroch P., Vlček J., Nam K.H., and Han J.G. Thin Solid Films 475 (2005) 208
45. Mientus R., and Ellmer K. Surf. Coat. Technol. 116-119 (1999) 1093
46. Svadkovski I.V., Golosov D.A., and Zavatskiy S.M. Vacuum 68 (2003) 283
47. Voevodin A.A., Stevenson P., Rebholz C., Schneider J.M., and Matthews A. Vacuum 46 (1995) 723
48. Miura T., and Asamaki T. Thin Solid Films 281-282 (1996) 190
49. Ye J., Ulrich S., Sell K., Leiste H., Stüber M., and Holleck H. Surf. Coat. Technol. 174-175 (2003) 959
50. Carrasco C., Segers L., Benavente B., and Vergara V. J. Mater. Process. Technol. 145 (2004) 371
51. Wong M.S., Sproul W.D., and Rohde S.L. Surf. Coat. Technol. 49 (1991) 121
52. Voevodin A.A., and Prasad S.V. J. Appl. Phys. 82 (1997) 855
53. Musil J., and Regent F. J. Vac. Sci. Technol., A 16 (1998) 3301
54. Diserens M., Patscheider J., and Lévy F. Surf. Coat. Technol. 120-121 (1999) 158
55. Rebouta L., Tavares C.J., Aimo R., Wang Z., Pischow K., Alves E., Rojas T.C., and Odriozola J.A. Surf. Coat. Technol. 133-134 (2000) 234
56. Musil J., Hrubý H., Zeman P., Zeman H., Čerstvý R., Mayrhofer P.H., and Mitterer C. Surf. Coat. Technol. 142-144 (2001) 603
57. Nose M., Deguchi Y., Mae T., Honbo E., Nagae T., and Nogi K. Surf. Coat. Technol. 174-175 (2003) 261
58. Ribeiro E., Rebouta L., Carvalho S., Vaz F., Fuentes G.G., Rodriguez R., Zazpe M., Alves E., Goudeau Ph., and Rivière J.P. Surf. Coat. Technol. 188-189 (2004) 351
59. Stueber M., Barna P.B., Simmonds M.C., Albers U., Leiste H., Ziebert C., Holleck H., Kovács A., Hovsepian P., and Gee I. Thin Solid Films 493 (2005) 104
60. Kim G.S., Kim B.S., Lee S.Y., and Hahn J.H. Thin Solid Films 506-507 (2006) 128
61. Mayrhofer P.H., Willmann H., and Mitterer C. Thin Solid Films 440 (2003) 174
62. Rebholz C., Schneider J.M., Voevodin A.A., Steinebrunner J., Charitidis C., Logothetidis S., Leyland A., and Matthews A. Surf. Coat. Technol. 113 (1999) 126
63. Kutschej K., Mayrhofer P.H., Kathrein M., Polcik P., Tessadri R., and Mitterer C. Surf. Coat. Technol. 200 (2005) 2358
64. Poláková H., Musil J., Vlček J., Allaart J., and Mitterer C. Thin Solid Films 444 (2003) 189
65. Cavaleiro A., Trindade B., and Vieira M.T. Surf. Coat. Technol. 175-175 (2003) 68
66. Zhang S., Fu Y., Du H., Zeng X.T., and Liu Y.C. Surf. Coat. Technol. 162 (2002) 42
67. Tsui T.Y., Oliver W.C., and Pharr G.M. J. Mater. Res. 11 (1996) 752
68. Herr W., and Broszeit E. Surf. Coat. Technol. 97 (1997) 335
69. Ribeiro E., Malczyk A., Carvalho S., Rebouta L., Fernandes J.V., Alves E., and Miranda A.S. Surf. Coat. Technol. 151-152 (2002) 515
70. Ulrich S., Holleck H., Ye J., Leiste H., Loos R., Stüber M., Pesch P., and Sattel S. Thin Solid Films 437 (2003) 164
71. Mitterer C., Mayrhofer P.H., and Musil J. Vacuum 71 (2003) 279
72. Carvalho S., Rebouta L., Cavaleiro A., Rocha L.A., Gomes J., and Alves E. Thin Solid Films 398-399 (2001) 391
73. Sanders D.M., and Anders A. Surf. Coat. Technol. 133-134 (2000) 78
74. Martin P.J., and Bendavid A. Thin Solid Films 394 (2001) 1
75. Boxman R.L., and Zhitomirsky V.N. Rev. Sci. Instrum. 77 (2006) 021101
76. Kennedy R.V. J. Phys. D, Appl. Phys. 34 (2001) 787
77. Miyano R., Saito T., Kimura K., Ikeda M., Takikawa H., and Sakakibara T. Thin Solid Films 390 (2001) 192
78. Kelly H., Giuliani L., and Rausch F. J. Phys. D, Appl. Phys. 36 (2003) 1980
79. Puchert M.K., Davis C.A., McKenzie D.R., and James B.W. J. Vac. Sci. Technol., A 10 (1992) 3493
80. Grondona D., Kelly H., and Minotti F.O. J. Appl. Phys. 99 (2006) 043304
81. Martin P.J., Bendavid A., and Takikawa H. J. Vac. Sci. Technol., A 17 (1999) 2351
82. Zhitomirsky V.N., Boxman R.L., and Goldsmith S. J. Vac. Sci. Technol., A 13 (1995) 2233
83. Zhitomirsky V.N., Kinrot U., Alterkop B., Boxman R.L., and Goldsmith S. Surf. Coat. Technol. 86-87 (1996) 263
84. Ivanov I., Ljungcrantz H., Håkansson G., Petrov I., and Sundgren J.-E. Surf. Coat. Technol. 92 (1997) 150
85. Boxman R.L., Beilis I.I., Gidalevich E., and Zhitomirsky V.N. IEEE Trans. Plasma Sci. 33 (2005) 1618
86. McKenzie D.R., McFall W.D., Sainty W.G., Yin Y., Durandet A., and Boswell R.W. Surf. Coat. Technol. 82 (1996) 326
87. Strauss G.N., and Pulker H.K. Thin Solid Films 442 (2003) 66
88. Choi S.R., Park I.-W., Park J.H., and Kim K.H. Surf. Coat. Technol. 179 (2004) 89
89. Veprek S., and Jilek M. Vacuum 67 (2002) 443
90. Lim S.H., McCulloch D.G., Bilek M.M.M., McKenzie D.R., Russo S.P., Barnard A.S., and Torpy A. J. Phys., Condens. Matter 17 (2005) 2791
91. Jeon J.-H., Jang C.H., Yoon S.-Y., Shin B.-C., and Kim K.H. Surf. Coat. Technol. 200 (2005) 1635
92. Park I.-W., Choi S.R., Suh J.H., Park C.-G., and Kim K.H. Thin Solid Films 447-448 (2004) 443
93. Kathrein M., Michotte C., Penoy M., Polcik P., and Mitterer C. Surf. Coat. Technol. 200 (2005) 1867
94. Martin P.J., Bendavid A., Cairney J.M., and Hoffman M. Surf. Coat. Technol. 200 (2005) 2228
95. Willmann H., Mayrhofer P.H., Persson P.O.Å., Reiter A.E., Hultman L., and Mitterer C. Scr. Mater. 54 (2006) 1847
96. Jilek M., Cselle T., Holubar P., Morstein M., Veprek-Heijman M.G.J., and Veprek S. Plasma Chem. Plasma Process. 24 (2004) 493
97. Fox-Rabinovich G.S., Weatherly G.C., Dodonov A.I., Kovalev A.I., Shuster L.S., Veldhuis S.C., Dosbaeva G.K., Wainstein D.L., and Migranov M.S. Surf. Coat. Technol. 177-178 (2004) 800
98. Rosén J., Anders A., and Schneider J.M. Appl. Phys. Lett. 80 (2002) 4109
99. Ribeiro E., Malczyk A., Carvalho S., Rebouta L., Fernandes J.V., Alves E., and Miranda A.S. Surf. Coat. Technol. 151-152 (2002) 515
100. Danilin B.S. Low-Temperature Plasma Application for Deposition of Thin Films (1982), Energoatomizdat, Moscow (in Russian)
101. Lee K.W., Chen Y.-H., Chung Y.-W., and Keer L.M. Surf. Coat. Technol. 177-178 (2004) 591
102. Li D.-J., Guruz M.U., Bhatia C.S., and Chung Y.-W. Appl. Phys. Lett. 81 (2002) 1113
103. Berg S., and Nyberg T. Thin Solid Films 476 (2005) 215
104. Musil J., and Poláková H. Surf. Coat. Technol. 127 (2000) 99
105. Musil J., and Hrubý H. Thin Solid Films 365 (2000) 104
106. Myung H.S., Lee H.M., Shaginyan L.R., and Han J.G. Surf. Coat. Technol. 163-164 (2003) 591
107. Veprek S., Männling H.-D., Niederhofer A., Ma D., and Mukherjee S. J. Vac. Sci. Technol., B 22 (2004) L5
108. Andreasen K.P., Jensen T., Petersen J.H., Chevallier J., Bøttiger J., and Schell N. Surf. Coat. Technol. 182 (2004) 268
109. Lewis D.B., Luo Q., Hovsepian P.Eh., and Münz W.-D. Surf. Coat. Technol. 184 (2004) 225