Correlation between plasma particle fluxes, microstructure and properties of titanium diboride thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 959-963

  Ye, J ^a   Ulrich, S ^a   Sell, K ^a   Leiste, H ^a   Stuber M ^a   Holleck, H ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Magnetron sputtering; Plasma; Titanium diboride

Indexed keywords

ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; RESIDUAL STRESSES; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

X-RAY REFLECTIVITY;

THIN FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041351883     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00455-9     Document Type: Article

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