Dual ion-beam deposition of metallic thin films

Surface and Coatings Technology

Volumn 84, Issue 1-3, 1996, Pages 485-490

  Šikola, Tomáš ^a   Spousta, Jiří ^a   Dittrichová, Libuše ^a   Nebojsa, Alois ^a   Peřina, Vratislav ^b   Češka, Radek ^a   Dub, Petr ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

Ion beam assisted deposition; Sputtering; Thin film growth; Thin film properties

Indexed keywords

ALUMINUM; AMORPHIZATION; COMPOSITION; DEPOSITION; FILM GROWTH; ION BEAMS; ION BOMBARDMENT; MOLYBDENUM; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPUTTERING; TITANIUM;

ARGON ION ENERGY; DEPOSITION RATE; DUAL ION BEAM DEPOSITION; ION BEAM ASSISTED DEPOSITION; ION BEAM SPUTTERING; ION TO ATOM ARRIVAL RATIO;

METALLIC FILMS;

EID: 0030270882     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(95)02823-4     Document Type: Article

References (21)

1. P. Sigmund, Phys. Rev., 184 (1969) 283.
2. J.M.E. Harper and J.J. Cuomo, J. Vac. Sci. Technol., 21 (1982) 737.
3. C. Schewebel and G. Gautherin, 34th AVS National Symposium, Anaheim, 1987.
4. J.W. Rabalais and D. Marton, Nucl. Instrum. Methods B, 67 (1992) 287.
5. J.S. Colligon, Mater. Sci. Eng. A, 139 (1991) 199-206.
6. Y. Andoh, K. Ogata and E. Kamijo, Nucl. Instrum. Methods B, 33 (1988) 678.
7. D.J. Kester, K.S. Ailey, D.J. Lichtenwalner and R.F. Davis, J. Vac. Sci. Technol. A, 12 (1994) 3074.
8. V. Dietz, P. Erhart, D. Guggi, H.-G. Haubold, W. Jäger, M. Prieler and W. Schilling, Nucl. Instrum. Methods B, 59/60 (1991) 284.
9. S. Masaki, H. Kobayashi and H. Morisaki, Nucl. Instrum. Methods B, 59/60 (1991) 292.
10. Z. Min, W.-Z. Li and H.-D. Li, Nucl. Instrum. Methods B, 59/60 (1991) 1358; H. Kheyrandish, J.S. Colligon and J.-K. Kim, J. Vac. Sci. Technol. A, 12 (1994) 2723.
11. Z. Min, W.-Z. Li and H.-D. Li, Nucl. Instrum. Methods B, 59/60 (1991) 1358; H. Kheyrandish, J.S. Colligon and J.-K. Kim, J. Vac. Sci. Technol. A, 12 (1994) 2723.
12. A.V. Bieli, H. Kheyrandish and J. Colligon, Thin Solid Films, 200 (1991) 283.
13. P. Reinke, W. Jacob and W. Möller, J. Appl. Phys., 74 (1993) 1354.
14. S. Scaglione and G. Emiliani, J. Vac. Sci. Technol. A, 7 (1989) 2303.
15. A.K. Rai and R.S. Bhattacharya, Nucl. Instrum. Methods B, 59/60 (1991) 280.
16. M. Barth, W. Ensinger, V. Hoffmann and G.K. Wolf, Nucl. Instrum. Methods B, 59/60 (1991) 254; W. Li, X. He and H. Li, J. Appl. Phys., 75 (1994) 2002.
17. M. Barth, W. Ensinger, V. Hoffmann and G.K. Wolf, Nucl. Instrum. Methods B, 59/60 (1991) 254; W. Li, X. He and H. Li, J. Appl. Phys., 75 (1994) 2002.
18. S.M. Rossnagel and J.J. Cuomo, Vacuum, 38 (1988) 73.
19. T. Šikola, Design, construction and application of the equipment based on the broad beam Kaufman ion source, Postgraduate Thesis, Technical University of Brno, 1993.
20. T. Šikola, J. Spousta and L. Dittrichová, Scr. Fac. Sci. Nat. Univ. Masaryk. Brun., 22 (1992) 119.
21. S. Mohan and M. Ghanashyam Krishna, Vacuum, 46 (1995) 645.