Influence of sputtering conditions on the structure and properties of Ti-Si-N thin films prepared by r.f.-reactive sputtering

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 261-265

  Nose, M ^a   Deguchi, Y ^a   Mae, T ^b   Honbo, E ^c   Nagae, T ^c   Nogi, K ^d  

^a UNIVERSITY OF TOYAMA   (Japan)

^b TOYAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

Nano indentation; Sputtering; Titanium nitride; Titanium silicon nitride; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

COMPOSITE MATERIALS; CRYSTAL LATTICES; ELASTIC MODULI; NANOSTRUCTURED MATERIALS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LATTICE DISTORTION;

TITANIUM ALLOYS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042858383     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00710-2     Document Type: Article

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