Synthesis and mechanical properties of Ti-Si-C films by a plasma-enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 446-451

  Han, Dae Suk ^a   Song, Pung Keun ^a   Cho, Kyung Mox ^a   Park, Yong Ho ^a   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

Friction coefficient; Microhardness; Nanocomposite; PECVD; Ti Si C

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLIC FILMS; MICROHARDNESS; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STEEL; SYNTHESIS (CHEMICAL); TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION TEMPERATURES; FRICTION COEFFICIENTS; GASEOUS MIXTURE; PROCESS PARAMETERS;

TITANIUM ALLOYS;

COATING; FILM; HARDNESS; MECHANICAL PROPERTY; VAPOR DEPOSITION;

EID: 14644407446     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.050     Document Type: Article

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