New technology for PACVD

Surface and Coatings Technology

Volumn 82, Issue 3, 1996, Pages 326-333

  McKenzie, D R ^a   McFall, W D ^a   Sainty, W G ^a   Yin, Y ^a   Durandet, A ^b   Boswell, R W ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Cathodic arc; Compressive stress; Helicon waves; Ion plating; Plasma processing

Indexed keywords

CATHODIC ARC; COMPRESSIVE STRESS; ENERGETIC BOMBARDMENT; ENERGY SELECTING MASS SPECTROMETER; HELICON WAVES; IN SITU ELLIPSOMETER; ION PLATING; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

CATHODES; COMPUTER CONTROL; ELLIPSOMETRY; FILM GROWTH; HELICONS; ION BOMBARDMENT; MASS SPECTROMETERS; PLASMA APPLICATIONS; PLASMA SOURCES; PLATING; REFRACTIVE INDEX;

CHEMICAL VAPOR DEPOSITION;

EID: 0030214082     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02776-9     Document Type: Article

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