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Volumn 174-175, Issue , 2003, Pages 1140-1144

Preparation of nanocomposite thin films by ion beam and plasma based sputtering processes

Author keywords

Hardness; Ion beam assisted sputtering deposition; Magnetron co sputtering; Nanocomposite

Indexed keywords

CRYSTALLOGRAPHY; HARDNESS; ION BEAM ASSISTED DEPOSITION; SILICON WAFERS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HARDNESS ENHANCEMENT;

NANOSTRUCTURED MATERIALS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041326479 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00541-3 Document Type: Article

Times cited : (12)

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