Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films

Thin Solid Films

Volumn 437, Issue 1-2, 2003, Pages 164-169

  Ulrich, S ^a   Holleck, H ^a   Ye, J ^a   Leiste, H ^a   Loos, R ^a   Stuber M ^a   Pesch, P ^b   Sattel, S ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b TZO GmbH   (Germany)

Author keywords

Aluminium; Chromium; Nitrides; Physical vapor deposition (PVD)

Indexed keywords

ELASTIC MODULI; HARDNESS; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; RESIDUAL STRESSES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

X-RAY REFLECTIVITY;

THIN FILMS;

EID: 0038711291     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00595-9     Document Type: Article

References (20)

1. Holleck H. Surf. Coat. Technol. 43/44:1990;245.
2. Stüber M., Leiste H., Ulrich S., Skokan A. Z. Metallk. 90:1999;10.
3. Münz W.-D. J. Vac. Sci. Technol. A. 4:1986;2717.
4. Holleck H. Surf. Coat. Technol. 36:1988;151.
5. Jehn H.A., Hoffmann S., Rückborn V.-E., Münz W.-D. J. Vac. Sci. Technol. A. 4:1986;2701.
6. Knotek O., Münz W.-D., Leyendecker T. J. Vac. Sci. Technol. A. 5:1987;2173.
7. Petrov I., Losbichler P., Bergstrom D., Green J.E., Münz W.-D., Hurkmans T., Trinh T. Thin Solid Films. 302:1997;179.
8. Kunisch C., Loos R., Stüber M., Ulrich S. Z. Metallkd. 90:1999;847.
9. Müller K.-H. Appl. Phys. A. 40:1986;209.
10. Davis C.A. Thin Solid Films. 226:1993;30.
11. Robertson J. Diamond Relat. Mater. 3:1994;361.
12. Lifshitz Y., Kasi S.R., Rabalais J.W., Eckstein W. Phys. Rev. B. 41:1990;10 468.
13. Hofsäss H., Feldermann H., Merk R., Sebastian M., Ronning C. Appl. Phys. A. 66:1998;153.
14. Reinke S., Kuhr M., Kulisch W. Diamond Relat. Mater. 5:1996;508.
15. Ulrich S., Ehrhardt H., Schwan J., Samlenski R., Brenn R. Diamond Relat. Mater. 7:1998;835.
16. Holleck H. J. Vac. Sci. Technol. A. 4:1986;2663.
17. Andrievski R.A., Anisimova I.A., Anisimov V.P. Thin Solid Films. 205:1991;171.
18. Ulrich S., Donner W., Dosch H., Ehrhardt H., Schwan J. Surf. Coat. Technol. 116-119:1999;274.
19. Parrat L.G. Phys. Rev. B. 95:1954;359.
20. Névot L., Groce P. Rev. Phys. Appl. 15:1980;761.