Characterisation parameters for unbalanced magnetron sputtering systems

Vacuum

Volumn 68, Issue 4, 2002, Pages 283-290

  Svadkovski, I V ^a   Golosov, D A ^a   Zavatskiy, S M ^a  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

Author keywords

Closed field configuration; Ion assisted deposition; Ion to atom ratio; Unbalance coefficient; Unbalanced magnetron

Indexed keywords

ATOMS; CHARACTERIZATION; COMPUTER SIMULATION; CONDENSATION; IONS; MAGNETIC FIELDS; PRESSURE EFFECTS;

UNBALANCED MAGNETRON;

MAGNETRON SPUTTERING;

EID: 0037073615     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00385-8     Document Type: Article

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