Influence of gas pressure on the ion current and its distribution in a filtered vacuum arc deposition system

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 263-270

  Zhitomirsky, V N ^a   Kinrot, U ^a   Alterkop, B ^a   Boxman, R L ^a   Goldsmith, S ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Background gas pressure; Ion current; Toroidal plasma duct; Vacuum arc

Indexed keywords

ANODES; CATHODES; CURRENT DENSITY; MAGNETIC FIELDS; PLASMAS; PRESSURE EFFECTS; SUBSTRATES; VACUUM APPLICATIONS; VECTORS;

BACKGROUND GAS PRESSURE; DEPOSITION CHAMBER; FILTERED VACUUM ARC DEPOSITION SYSTEM; GAUSSIAN DISTRIBUTION; ION CURRENT; ION CURRENT DENSITY DISTRIBUTION; TOROIDAL PLASMA DUCT; VACUUM ARC;

DEPOSITION;

EID: 0030381673     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03024-1     Document Type: Article

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