Structure-hardness relations in sputtered Ti-Al-V-N films

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 189-198

  Polakova H ^a   Musil, J ^a   Vlcek J ^a   Allaart, J ^b   Mitterer, C ^c  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b Hilti AG   (Liechtenstein)

^c UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Chemical composition; Hardness; Magnetron sputtering; Mechanical properties; Structure; Ti Al V N nanostructured films

Indexed keywords

HARDNESS; NANOSTRUCTURED MATERIALS; SPUTTERING; TITANIUM COMPOUNDS;

NANOSTRUCTURED FILMS;

THIN FILMS;

EID: 0142055130     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01096-4     Document Type: Article

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