SCOPUS 정보 검색 플랫폼

Volumn 116-119, Issue , 1999, Pages 1093-1101

Reactive DC magnetron sputtering of elemental targets in Ar/N2 mixtures: Relation between the discharge characteristics and the heat of formation of the corresponding nitrides

(2) Mientus, R a Ellmer, K b

a Optotransmitter Umweltschutz T (Germany)

b HAHN MEITNER INSTITUT (Germany)

Author keywords

Discharge characteristics; Heat of formation; Nitrides; Reactive magnetron sputtering

Indexed keywords

ALUMINUM; ARGON; CHROMIUM; INDIUM; NITROGEN; SILICON; SILICON NITRIDE; SPUTTER DEPOSITION; TARGETS; TIN; TITANIUM; TITANIUM NITRIDE;

REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0033311629 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(99)00124-3 Document Type: Article

Times cited : (103)

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