Effect of Si content on the properties of TiAl-Si-N films deposited by closed field unbalanced magnetron sputtering with vertical magnetron sources

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 128-132

  Kim, Gwang Seok ^a   Kim, Bom Sok ^a   Lee, Sang Yul ^a   Hahn, Jun Hee ^b  

^a Hankuk Aviation University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

CFUBMS; Nanocomposite; Superhard coatings; TiAl Si N

Indexed keywords

AMORPHOUS ALLOYS; COMPOSITION; CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MORPHOLOGY; NANOSTRUCTURED MATERIALS; TITANIUM ALLOYS; WEAR RESISTANCE;

NANOINDENTER AND WEAR TESTER; SUPERHARD COATINGS;

THIN FILMS;

EID: 33645217672     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.136     Document Type: Conference Paper

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