SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 17, Issue 7, 2005, Pages 795-803

Silicon nanocrystals: Size matters

(4) Heitmann, Johannes a,b Müller, Frank a Zacharias, Margit a Gösele, Ulrich a

a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

b INFINEON TECHNOLOGIES AG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ION IMPLANTATION; OXIDATION; PARTICLE SIZE ANALYSIS; PASSIVATION; PHASE SEPARATION; SILICON; STOICHIOMETRY; SUPERLATTICES; SYNTHESIS (CHEMICAL);

FULL WIDTH AT HALF MAXIMUM (FWHM); RESONANT EXCITATION; SILICON NANOCRYSTALS; SIZE CONTROL;

NANOSTRUCTURED MATERIALS;

EID: 17344371673 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200401126 Document Type: Review

Times cited : (284)

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