Visible electroluminescence from Si+-implanted SiO2 films thermally grown on crystalline Si

Solid State Communications

Volumn 97, Issue 12, 1996, Pages 1039-1042

  Liao, Liang Sheng ^a   Bao, Xi Mao ^a   Li, Ning Sheng ^a   Zheng, Xiang Qin ^a   Min, Nai Ben ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

A. nanostructures; D. optical properties; E. luminescence

Indexed keywords

CRYSTAL GROWTH; ELECTROLUMINESCENCE; ION IMPLANTATION; MIS DEVICES; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; THERMAL EFFECTS;

CRYSTALLINE SILICON WAFERS;

SEMICONDUCTING FILMS;

EID: 0030105880     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(95)00846-2     Document Type: Article

References (15)

1. L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. K.H. Jung, S. Shih, and D.L. Kwong, J.Electrochem. Soc. 140, 3046 (1993).
3. H. Takagi, H. Ogawa, Y. Yamazaki, A. Ishizaki, and T. Nakagir, Appl. Phys. Lett. 56, 2379 (1990).
4. X.N. Liu, X.W. Wu, X.M. Bao, and Y.L. He, Appl. Phys. Lett. 64, 220 (1994).
5. E. Werwa, A.A. Seraphin, L.A. Chiu, C. Zhou, and K.D. Kolengrander, Appl. Phys. Lett. 64, 1821 (1994).
6. Y. Osaka, K. Tsunetomo, F. Toyomura, H. Myoren, and K. Kohno, Jpn. J. Appl. Phys. 31, L365 (1992).
7. Y. Maeda, N. Tsukamoto, Y. Yazawa, Y. Kanemitsu, and Y. Masumoto, Appl. Phys. Lett. 59, 3168 (1991).
8. S. Hayashi, T. Nagareda, Y. Kanzawa, and K. Yamamoto, Jpn. J. Appl. Phys. 32, 3840 (1993).
9. G.G. Qin, A.P. Lin, B.R. Zhang, and B.C. Li, J. Appl. Phys. 78, 2006 (1995).
10. T. Shimizu-Iwayama, S. Nakao, and K. Saitoh, Appl. Phys.Lett. 65, 1814 (1994).
11. P. Mutti, G. Ghislotti, S. Bertoni, L. Bonoldi, G.F. Cerofolini, L. Meda, E. Grilli, and M. Guzzi, Appl. Phys. Lett. 66, 851 (1995).
12. J.H. Stathis and M.A. Kastner, Phys. Rev. B35, 2972 (1987).
13. D.J. DiMaria, J.R. Kirtley, E.J. Pakulis, D.W. Dong, T.S. Kuan, F.L. Pesavento, T.N. Theis, J.A. Cutro, and S.D. Brorson, J. Appl. Phys. 56, 401 (1984).
14. E.A. Irene, N.J. Chou, D.W. Dong, and E. Tierney, J.Electrochem. Soc. 127, 2518 (1980).
15. D.J. DiMaria, D.W. Dong, C. Falcony, T.N. Theis, J.R. Kirtley, J.C. Tsang, D.R. Young, F.L. Pesavento, and S.D. Brorson, J.Appl. Phys. 54, 5801 (1983).